18047342. PELLICLE AND METHOD OF USING THE SAME simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

From WikiPatents
Jump to navigation Jump to search

PELLICLE AND METHOD OF USING THE SAME

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Chue San Yoo of Hsinchu (TW)

Hsin-Chang Lee of Hsinchu (TW)

Pei-Cheng Hsu of Hsinchu (TW)

Yun-Yue Lin of Hsinchu (TW)

PELLICLE AND METHOD OF USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18047342 titled 'PELLICLE AND METHOD OF USING THE SAME

Simplified Explanation

The abstract describes a pellicle frame that includes a check valve and a single recess for a gasket. The check valve allows gas flow from the inside to the outside of the pellicle, while the gasket fits within the recess.

  • The pellicle frame has a check valve that permits gas flow from the inside to the outside.
  • The frame has a single recess on its bottom surface.
  • A gasket is designed to fit within the single recess.

Potential Applications

  • Semiconductor manufacturing: The pellicle frame can be used in the production of semiconductor chips to protect them from contaminants.
  • Optical devices: The frame can be utilized in optical devices such as lenses or mirrors to prevent dust or particles from affecting their performance.

Problems Solved

  • Contamination prevention: The check valve and gasket combination helps to maintain a clean environment by allowing gas flow while keeping out contaminants.
  • Simplified design: The single recess and gasket provide a straightforward and efficient solution for sealing the pellicle frame.

Benefits

  • Enhanced protection: The check valve ensures that gas can escape from the inside, preventing pressure buildup and potential damage to the pellicle.
  • Easy installation: The gasket fitting into the single recess simplifies the assembly process, saving time and effort.


Original Abstract Submitted

A pellicle frame includes a check valve, wherein the check valve is configured to permit gas flow from an interior of the pellicle to an exterior of the pellicle. The pellicle frame further includes a bottom surface of the frame defines only a single recess therein. The pellicle frame further includes a gasket configured to fit within the single recess.

Retrieved from "http://wikipatents.org/index.php?title=18047342._PELLICLE_AND_METHOD_OF_USING_THE_SAME_simplified_abstract_(TAIWAN_SEMICONDUCTOR_MANUFACTURING_COMPANY,_LTD.)&oldid=20330"