17993055. GAS SUPPLY MODULE AND SUBSTRATE PROCESSING APPARATUS USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
Contents
GAS SUPPLY MODULE AND SUBSTRATE PROCESSING APPARATUS USING THE SAME
Organization Name
Inventor(s)
Youngil Kang of Hwaseong-si (KR)
Byeongsang Kim of Hwaseong-si (KR)
Yongbeom Park of Yongin-si (KR)
Kyuhee Han of Seongnam-si (KR)
GAS SUPPLY MODULE AND SUBSTRATE PROCESSING APPARATUS USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17993055 titled 'GAS SUPPLY MODULE AND SUBSTRATE PROCESSING APPARATUS USING THE SAME
Simplified Explanation
The patent application describes a substrate processing apparatus used in manufacturing processes, such as semiconductor fabrication. It includes a process chamber, a substrate support structure, and a gas supply module.
- The process chamber is where the substrate is processed.
- The substrate support structure is located at the bottom of the process chamber and is designed to hold the substrate.
- The gas supply module is positioned at the top of the process chamber and supplies a process gas to the substrate.
- The gas supply module consists of a showerhead, which has a first showerhead body and a coating layer.
- The first showerhead body has multiple injection ports that transfer gas from a gas inlet into the process chamber.
- The first showerhead body is made of a metal matrix composite (MMC), which provides strength and durability.
- The coating layer covers the first showerhead body and is made of aluminum fluoride.
- The aluminum fluoride coating enhances the performance and longevity of the showerhead.
Potential applications of this technology:
- Semiconductor manufacturing
- LCD panel production
- Solar cell fabrication
Problems solved by this technology:
- Improves the durability and lifespan of the showerhead
- Enhances the performance and efficiency of the substrate processing apparatus
- Reduces maintenance and replacement costs
Benefits of this technology:
- Increased productivity and yield in manufacturing processes
- Extended lifetime of the substrate processing apparatus
- Cost savings through reduced maintenance and replacement needs
Original Abstract Submitted
A substrate processing apparatus includes: a process chamber; a substrate support structure disposed at a lower portion of the process chamber and configured to accommodate a substrate; and a gas supply module disposed at an upper portion of the process chamber and supplying a process gas to the substrate, wherein the gas supply module includes a showerhead that includes: a first showerhead body including a plurality of injection ports configured to transfer gas transferred from a gas inlet into the process chamber; and a coating layer covering the first showerhead body and including aluminum fluoride, wherein the first showerhead body includes a metal matrix composite (MMC).
