17975054. METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Young Chul Shin of Hwaseong-si (KR)

MinWoo Rhee of Seoul (KR)

Su Min Kim of Hwaseong-si (KR)

Il Young Han of Uiwang-si (KR)

Nung Pyo Hong of Goyang-si (KR)

Seung Don Lee of Seongnam-si (KR)

Kyeong Bin Lim of Seoul (KR)

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17975054 titled 'METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

Simplified Explanation

The abstract describes a method for manufacturing a semiconductor device using a specific apparatus and laser technology.

  • The method involves using a chamber, support structure, and a bonding structure consisting of two substrate structures and a bonding metal layer.
  • A laser device is used to irradiate a laser beam onto the bonding structure.
  • The purpose of this method is to manufacture a semiconductor device using the specific apparatus and laser technology.

Potential Applications

This technology can be applied in various industries and fields, including:

  • Electronics manufacturing
  • Semiconductor industry
  • Research and development of advanced electronic devices

Problems Solved

The method described in the patent application addresses the following problems:

  • Efficient manufacturing of semiconductor devices
  • Ensuring proper bonding between substrate structures
  • Enhancing the overall quality and performance of the semiconductor device

Benefits

The use of this method and apparatus offers several benefits:

  • Improved precision and accuracy in manufacturing semiconductor devices
  • Enhanced bonding strength between substrate structures
  • Increased efficiency and productivity in the manufacturing process
  • Potential for cost savings in the production of semiconductor devices.


Original Abstract Submitted

A method for manufacturing a semiconductor device is provided. The method for manufacturing a semiconductor device which uses an apparatus for manufacturing the semiconductor device including: a chamber, a support structure provided inside the chamber, and configured to support a bonding structure that comprises a first substrate structure, a second substrate structure, and a bonding metal layer provided between the first substrate structure and the second substrate structure, and a laser device which is provided above the chamber, the semiconductor device manufacturing method comprising: irradiating a laser beam to the bonding structure using the laser device.