17974871. PLANARIZATION APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
PLANARIZATION APPARATUS AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
Hiroshi Kurosawa of Tochigi (JP)
PLANARIZATION APPARATUS AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 17974871 titled 'PLANARIZATION APPARATUS AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The patent application describes a planarization apparatus that includes multiple processors for performing a planarization process on a substrate. Each processor has a substrate chuck and is capable of planarizing a substrate held by the chuck. A conveyer is used to transport the substrate chucks along a common conveyance path shared by the processors. A supplier is positioned along the conveyance path to supply a composition needed for the planarization process onto the substrate held by the chuck.
- The apparatus includes multiple processors, each with a substrate chuck, for planarizing substrates.
- A conveyer system is used to transport the substrate chucks along a common conveyance path.
- A supplier is positioned along the conveyance path to provide the necessary composition for the planarization process.
Potential Applications
- Semiconductor manufacturing: This apparatus can be used in the production of semiconductor devices, where planarization processes are commonly performed.
- Flat panel display manufacturing: The apparatus can also be applied in the production of flat panel displays, which require planarization for optimal performance.
Problems Solved
- Efficient planarization: The apparatus allows for simultaneous planarization of multiple substrates, increasing throughput and efficiency.
- Consistent supply: The supplier ensures a continuous and reliable supply of the composition needed for the planarization process.
Benefits
- Increased productivity: The ability to process multiple substrates simultaneously improves overall productivity.
- Improved quality control: The consistent supply of the composition helps maintain consistent planarization results.
- Cost savings: The efficient use of resources and increased throughput can lead to cost savings in manufacturing processes.
Original Abstract Submitted
A planarization apparatus includes a plurality of processors each configured to perform a planarization process on a substrate. Each of the processors includes a substrate chuck, and is configured to perform a planarization process on a substrate chucked by the substrate chuck. A conveyer is configured to convey a substrate chuck of a processor selected from the plurality of processors along a conveyance path including a common conveyance path shared by the plurality of processors. A supplier is arranged on a path of movement of the substrate chuck by the conveyer along the common conveyance path, and is configured to supply a composition to be used in the planarization process onto the substrate chucked by the substrate chuck.
