17969200. OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

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OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Seung Woo Lee of Seoul (KR)

Wook Rae Kim of Suwon-si (KR)

Kwang Soo Kim of Osan-si (KR)

Myung Jun Lee of Seongnam-si (KR)

Seo Yeon Jeong of Yongin-si (KR)

Sung Ho Jang of Yongin-si (KR)

OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 17969200 titled 'OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Simplified Explanation

The patent application describes an optical measurement apparatus that uses light to generate a pupil image of a measurement target. It includes a polarization generator that generates polarized light, a self-interference generator that divides the pupil image into multiple beams using the polarized light and causes them to interfere with each other to create a self-interference image, and an image analysis unit that extracts phase data from the self-interference image. The image analysis unit then uses the phase data to move the measurement target to a focus position.

  • Optical measurement apparatus using light to generate a pupil image of a measurement target
  • Polarization generator generates polarized light from the light
  • Self-interference generator divides the pupil image into multiple beams using the polarized light
  • Multiple beams interfere with each other to create a self-interference image
  • Image analysis unit extracts phase data from the self-interference image
  • Phase data is used to move the measurement target to a focus position

Potential Applications

  • Optical measurement and analysis in various fields such as microscopy, astronomy, and semiconductor manufacturing
  • Precision positioning and focusing of measurement targets in industrial processes
  • Non-destructive testing and inspection in material science and engineering

Problems Solved

  • Accurate measurement and analysis of optical properties of a target by generating a self-interference image
  • Precise positioning and focusing of the measurement target using phase data extracted from the self-interference image

Benefits

  • Improved accuracy and reliability of optical measurements
  • Enhanced precision in positioning and focusing of measurement targets
  • Non-destructive and non-invasive measurement and analysis techniques


Original Abstract Submitted

A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.