17967228. ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER
Organization Name
Inventor(s)
Yasuhiro Hidaka of Yokohama City (JP)
ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER - A simplified explanation of the abstract
This abstract first appeared for US patent application 17967228 titled 'ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER
Simplified Explanation
The abstract describes an ellipsometer that can improve the calculation of ellipsometry coefficients (ψ, Δ) even when using a light source with a wide wavelength band and a spectrometer. It also mentions an apparatus for inspecting a semiconductor device that incorporates this ellipsometer.
- The ellipsometer includes a polarizing optical element unit that separates reflected light into two polarization components with orthogonal polarization directions.
- An analyzer unit transmits components of a different direction to make the two polarization components interfere with each other, forming an interference fringe in the shape of a concentric circle.
- An image detector detects the interference fringe, and processing circuitry calculates the ellipsometry coefficients from the fringe.
Potential Applications
- Semiconductor device inspection
- Thin film characterization
- Surface analysis
Problems Solved
- Improved calculation of ellipsometry coefficients with a combination of a wide wavelength band light source and a spectrometer
- Enhanced throughput in ellipsometry measurements
Benefits
- Accurate measurement of ellipsometry coefficients
- Increased efficiency in ellipsometry measurements
- Versatile application in various industries, such as semiconductor manufacturing and materials research
Original Abstract Submitted
An ellipsometer capable of improving a throughput calculating ellipsometry coefficients (ψ, Δ) even when performing measurement with a combination of a light source having a wide wavelength band and a spectrometer, and an apparatus for inspecting a semiconductor device is e hid g the ellipsometer may be provided. The ellipsometer includes a polarizing optical element unit for separating reflected light into two polarization components having polarization directions that are orthogonal to each other in a radial direction with respect to an optical axis of an optical system of the reflected light, an analyzer unit for transmitting components of a direction different from the polarization directions of the two polarization components to make the two polarization components interfere with each other, and to form an interference fringe in a form of a concentric circle, an image detector for detecting the interference fringe, and processing circuitry for calculating ellipsometry coefficients from the interference fringe.
