17966864. SEMICONDUCTOR DEVICE HAVING VIA PROTECTIVE LAYER simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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SEMICONDUCTOR DEVICE HAVING VIA PROTECTIVE LAYER

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Jumyong Park of Cheonan-si (KR)

Solji Song of Suwon-si (KR)

Jinho An of Seoul (KR)

Jeonggi Jin of Seoul (KR)

Jinho Chun of Seoul (KR)

Juil Choi of Seongnam-si (KR)

SEMICONDUCTOR DEVICE HAVING VIA PROTECTIVE LAYER - A simplified explanation of the abstract

This abstract first appeared for US patent application 17966864 titled 'SEMICONDUCTOR DEVICE HAVING VIA PROTECTIVE LAYER

Simplified Explanation

The patent application describes a semiconductor device that includes several layers and structures to improve its performance and protect its components.

  • The device has a via passivation layer on the inactive surface of a substrate, which helps to insulate and protect the substrate.
  • A through-electrode vertically penetrates both the substrate and the via passivation layer, allowing for electrical connections.
  • A concave portion is formed in the top surface of the via passivation layer, next to the through-electrode.
  • A via protective layer is added to fill the concave portion, creating a smooth and protective surface.
  • The via protective layer has a band shape that surrounds the through-electrode in a horizontal cross-sectional view.

Potential applications of this technology:

  • Semiconductor manufacturing industry
  • Electronics industry
  • Integrated circuit design and production

Problems solved by this technology:

  • Improved insulation and protection of the substrate
  • Enhanced electrical connections
  • Prevention of damage to the through-electrode and surrounding components

Benefits of this technology:

  • Increased reliability and durability of the semiconductor device
  • Improved performance and functionality
  • Enhanced manufacturing efficiency and yield


Original Abstract Submitted

A semiconductor device is disclosed. The semiconductor device includes a via passivation layer disposed on an inactive surface of a substrate, a through-electrode vertically penetrating the substrate and the via passivation layer, a concave portion formed in the top surface of the via passivation layer and disposed adjacent to the through-electrode, and a via protective layer coplanar with the via passivation layer and the through-electrode and to fill the concave portion. In a horizontal cross-sectional view, the via protective layer has a band shape surrounding the through-electrode.