17963609. Optical Element for Deconvolution simplified abstract (Samsung Electronics Co., Ltd.)
Contents
Optical Element for Deconvolution
Organization Name
Inventor(s)
Ernest Rehmatulla Post of San Francisco CA (US)
Optical Element for Deconvolution - A simplified explanation of the abstract
This abstract first appeared for US patent application 17963609 titled 'Optical Element for Deconvolution
Simplified Explanation
The abstract describes a method for constructing a corrective phase mask for an optical element. This involves determining a phase modulation field based on the source field and image field for each wavelength, and then combining them to create a multi-wavelength phase modulation field.
- The method involves propagating a point source field from an object plane to a corrective mask plane to determine a source field.
- The point source field is also propagated from an image plane to the corrective mask plane to determine an image field.
- A phase modulation field is determined for each wavelength based on the source field and image field.
- The phase modulation fields for each wavelength are combined to create a multi-wavelength phase modulation field.
Potential applications of this technology:
- Optical element correction: The method can be used to construct a corrective phase mask for optical elements, improving their performance and correcting aberrations.
- Imaging systems: This technology can be applied to improve the image quality and resolution of various imaging systems, such as cameras, telescopes, and microscopes.
- Laser systems: The method can be used to optimize laser systems by correcting phase distortions and improving beam quality.
Problems solved by this technology:
- Aberration correction: The method addresses the problem of aberrations in optical elements by constructing a corrective phase mask, which improves the overall performance and image quality.
- Multi-wavelength optimization: By combining the phase modulation fields for different wavelengths, the method enables the correction of aberrations across a range of wavelengths, making it suitable for multi-wavelength applications.
Benefits of this technology:
- Improved image quality: The corrective phase mask helps to correct aberrations, resulting in sharper and clearer images.
- Versatility: The method can be applied to various optical elements and imaging systems, making it a versatile solution for improving optical performance.
- Multi-wavelength capability: The ability to combine phase modulation fields for different wavelengths allows for optimization across a wide range of wavelengths, enhancing the functionality of the technology.
Original Abstract Submitted
In one embodiment, a method of constructing a corrective phase mask for an optical element, includes propagating, for each of one or more wavelengths, a point source field from an object plane to a corrective mask plane to determine a source field and propagating, for each of the one or more wavelengths, the point source field from an image plane to the corrective mask plane to determine an image field. The method may further include determining, for each of the one or more wavelengths, a phase modulation field based on the source field and the image field; and determining a multi-wavelength phase modulation field based on combining the phase modulation field for each of the one or more wavelengths.
