17962410. BIPOLAR ELECTROSTATIC CHUCK FOR ETCH CHAMBER simplified abstract (Applied Materials, Inc.)
Contents
- 1 BIPOLAR ELECTROSTATIC CHUCK FOR ETCH CHAMBER
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 BIPOLAR ELECTROSTATIC CHUCK FOR ETCH CHAMBER - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.9.1 Unanswered Questions
- 1.9.2 How does the design of the bipolar electrostatic chuck contribute to improved stability and control during manufacturing processes?
- 1.9.3 What are the potential limitations or challenges associated with implementing bipolar electrostatic chucks in industrial settings?
- 1.10 Original Abstract Submitted
BIPOLAR ELECTROSTATIC CHUCK FOR ETCH CHAMBER
Organization Name
Inventor(s)
Shinichi Oki of Chiba prefecture (JP)
Yuji Aoki of Kanagawa prefecture (JP)
Trishul Byregowda Shivalingaiah of Bangalore (IN)
BIPOLAR ELECTROSTATIC CHUCK FOR ETCH CHAMBER - A simplified explanation of the abstract
This abstract first appeared for US patent application 17962410 titled 'BIPOLAR ELECTROSTATIC CHUCK FOR ETCH CHAMBER
Simplified Explanation
The abstract describes embodiments of a bipolar electrostatic chuck, which includes a ceramic plate with positive and negative electrodes, an aluminum base plate, conduits for electrical coupling, and insulative tubes.
- Ceramic plate with positive and negative electrodes arranged in specific patterns.
- Aluminum base plate coupled to the ceramic plate.
- Positive and negative conduits for electrical coupling.
- Insulative tubes around conduits for insulation.
Potential Applications
The technology could be used in semiconductor manufacturing, specifically in processes such as wafer bonding and lithography.
Problems Solved
The bipolar electrostatic chuck helps in securely holding and manipulating delicate materials during manufacturing processes, preventing damage or misalignment.
Benefits
The chuck provides precise control over the positioning and stability of materials, leading to improved accuracy and efficiency in manufacturing processes.
Potential Commercial Applications
The technology could be applied in industries such as semiconductor, electronics, and optics for various manufacturing processes requiring precise material handling.
Possible Prior Art
Prior art may include traditional electrostatic chucks or other types of material handling devices used in semiconductor manufacturing processes.
Unanswered Questions
How does the design of the bipolar electrostatic chuck contribute to improved stability and control during manufacturing processes?
The specific arrangement of positive and negative electrodes in the ceramic plate, along with the aluminum base plate and conduits, allows for better control and stability of materials during manufacturing processes.
What are the potential limitations or challenges associated with implementing bipolar electrostatic chucks in industrial settings?
Some potential challenges could include the complexity of the design, maintenance requirements, and compatibility with existing manufacturing equipment.
Original Abstract Submitted
Embodiments of bipolar electrostatic chucks are provided herein. In some embodiments, a bipolar electrostatic chuck includes a ceramic plate; a plurality of electrodes disposed in the ceramic plate, wherein the plurality of electrodes include one or more positive electrodes arranged in a first pattern and one or more negative electrodes arranged in a second pattern; an aluminum base plate coupled to the ceramic plate; a positive conduit extending through the aluminum base plate and electrically coupled to the one or more positive electrodes, and a negative conduit extending through the aluminum base plate and electrically coupled to the one or more negative electrodes; and a first insulative tube disposed about each of the positive conduit and the negative conduit.
