17959189. CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS simplified abstract (Applied Materials, Inc.)
Contents
- 1 CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS
Organization Name
Inventor(s)
Vishwas Kumar Pandey of Madhya Pradesh (IN)
Kartik Bhupendra Shah of Saratoga CA (US)
Ala Moradian of Sunnyvale CA (US)
CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS - A simplified explanation of the abstract
This abstract first appeared for US patent application 17959189 titled 'CASSETTE STRUCTURES AND RELATED METHODS FOR BATCH PROCESSING IN EPITAXIAL DEPOSITION OPERATIONS
Simplified Explanation
The present disclosure describes a cassette structure for batch processing in epitaxial deposition operations, including inlet and outlet openings, as well as multiple levels with substrate supports mounted on sidewalls.
- The cassette structure is designed for use in a substrate processing chamber.
- It includes a first wall, a second wall, and sidewalls with inlet and outlet openings.
- The cassette has multiple levels with substrate supports mounted on the sidewalls.
Potential Applications
This technology could be applied in semiconductor manufacturing processes, specifically in epitaxial deposition operations where batch processing is required.
Problems Solved
This innovation solves the problem of efficiently processing multiple substrates in a single chamber, streamlining the epitaxial deposition process.
Benefits
The cassette structure allows for increased throughput and efficiency in epitaxial deposition operations, reducing processing time and improving overall productivity.
Potential Commercial Applications
One potential commercial application of this technology could be in the semiconductor industry for manufacturing advanced electronic devices with high-quality epitaxial layers.
Possible Prior Art
Prior art may include similar cassette structures used in other batch processing operations within the semiconductor industry.
Unanswered Questions
How does this cassette structure compare to traditional single-substrate processing methods in terms of efficiency and throughput?
This cassette structure allows for batch processing of multiple substrates simultaneously, increasing efficiency and throughput compared to traditional single-substrate processing methods.
What are the potential challenges in implementing this cassette structure in existing substrate processing chambers?
Some potential challenges in implementing this cassette structure may include compatibility issues with existing equipment, as well as the need for proper calibration and alignment to ensure uniform deposition on all substrates.
Original Abstract Submitted
The present disclosure relates to cassette structures and related methods for batch processing in epitaxial deposition operations. In one implementation, a cassette configured for disposition in a substrate processing chamber includes a first wall, a second wall spaced from the first wall, and one or more sidewalls extending between and coupled to the first wall and the second wall. The cassette includes one or more inlet openings formed in the one or more sidewalls, and one or more outlet openings formed in the one or more sidewalls opposite the one or more inlet openings. The cassette includes a plurality of levels that include a plurality of substrate supports mounted to the one or more sidewalls and spaced from each other along the one or more sidewalls.
