17959076. MEMBRANE FAILURE DETECTION SYSTEM simplified abstract (Applied Materials, Inc.)
Contents
- 1 MEMBRANE FAILURE DETECTION SYSTEM
MEMBRANE FAILURE DETECTION SYSTEM
Organization Name
Inventor(s)
Chang Zhang of Santa Clara CA (US)
Jian J. Chen of Fremont CA (US)
Quoc Truong of San Ramon CA (US)
Jamie Stuart Leighton of Palo Alto CA (US)
MEMBRANE FAILURE DETECTION SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 17959076 titled 'MEMBRANE FAILURE DETECTION SYSTEM
Simplified Explanation
The polishing system described in the patent application includes a pressure system, a substrate carrier with a membrane, a sensor, and a control system. The membrane is connected to the pressure system, and the sensor monitors the pressure system to detect conditions and produce an output. The control system processes this output to determine the presence of fluid in the pressure system.
- The system includes a pressure system, substrate carrier with a membrane, sensor, and control system.
- The membrane is fluidly coupled to the pressure system.
- The sensor monitors the pressure system and produces an output based on detected conditions.
- The control system processes the sensor output to detect the presence of fluid in the pressure system.
Potential Applications
This technology could be applied in industries such as semiconductor manufacturing, optical lens production, and precision engineering where precise control of pressure systems is crucial.
Problems Solved
This technology helps in detecting the presence of fluid in the pressure system, preventing potential damage or malfunction due to fluid contamination.
Benefits
The system provides real-time monitoring and detection of fluid presence, ensuring the efficiency and reliability of the polishing process. It can help in maintaining the quality of polished surfaces and prolonging the lifespan of polishing equipment.
Potential Commercial Applications
"Real-time Fluid Detection System for Polishing Equipment" - This title is SEO optimized for commercial applications of the technology in the polishing industry.
Possible Prior Art
One possible prior art could be pressure monitoring systems used in other industrial processes to ensure the proper functioning of equipment and prevent damage due to fluid contamination.
Unanswered Questions
How does the system handle different types of fluids in the pressure system?
The patent application does not specify how the system distinguishes between different types of fluids that may be present in the pressure system. Further details on this aspect would be helpful for a comprehensive understanding of the technology.
What is the expected maintenance schedule for the polishing system with this technology?
The patent application does not mention the maintenance requirements or schedule for the polishing system incorporating this technology. Understanding the maintenance needs would be essential for potential users to assess the long-term cost and feasibility of implementing this system.
Original Abstract Submitted
A polishing system includes a pressure system, a substrate carrier including a membrane, a first sensor, and a control system. A first compartment of the membrane is fluidly coupled to the pressure system. The first sensor is configured to monitor the pressure system and produce a first output based on conditions detected in the pressure system. The control system coupled to the first sensor and configured to process the first output to produce a first processed output, and the control system configured to compare the first processed output to a threshold to detect a presence of a fluid in the pressure system.
