17958210. ADAPTIVE SUPER BLOCK WEAR LEVELING simplified abstract (Micron Technology, Inc.)
Contents
- 1 ADAPTIVE SUPER BLOCK WEAR LEVELING
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 ADAPTIVE SUPER BLOCK WEAR LEVELING - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 How does this technology impact the overall performance of memory devices in real-world applications?
- 1.11 What are the potential challenges or limitations of implementing this technology on a large scale?
- 1.12 Original Abstract Submitted
ADAPTIVE SUPER BLOCK WEAR LEVELING
Organization Name
Inventor(s)
Ying Yu Tai of Mountain View CA (US)
Seungjune Jeon of Santa Clara CA (US)
ADAPTIVE SUPER BLOCK WEAR LEVELING - A simplified explanation of the abstract
This abstract first appeared for US patent application 17958210 titled 'ADAPTIVE SUPER BLOCK WEAR LEVELING
Simplified Explanation
The abstract describes a system that includes a memory device with multiple dies and a processing device to perform operations related to managing memory units with different endurance metrics.
- The system identifies multiple management units to be programmed, each containing memory cells from dies with different endurance metrics.
- It determines a media endurance metric for each management unit and calculates an endurance exhaustion parameter based on the relationship between media endurance metrics.
- Operations are distributed to each management unit based on the calculated endurance exhaustion parameter.
Potential Applications
This technology could be applied in various industries such as data storage, semiconductor manufacturing, and electronic devices where memory management and optimization are crucial.
Problems Solved
This technology addresses the challenge of efficiently managing memory units with varying endurance metrics, ensuring optimal performance and longevity of the memory device.
Benefits
- Improved memory management efficiency - Enhanced performance and reliability of memory devices - Extended lifespan of memory cells with different endurance metrics
Potential Commercial Applications
The technology can be utilized in solid-state drives (SSDs), embedded systems, cloud storage servers, and other memory-intensive applications to enhance memory management and optimize performance.
Possible Prior Art
One possible prior art could be memory management systems that focus on optimizing memory usage and performance but may not specifically address managing memory units with different endurance metrics.
Unanswered Questions
How does this technology impact the overall performance of memory devices in real-world applications?
The abstract provides a detailed explanation of the system's operations and capabilities, but it does not delve into the practical implications of implementing this technology in various devices and systems.
What are the potential challenges or limitations of implementing this technology on a large scale?
While the abstract highlights the benefits and functionalities of the system, it does not discuss any potential obstacles or drawbacks that may arise when deploying this technology in commercial or industrial settings.
Original Abstract Submitted
A system can include a memory device a memory device comprising multiple dies, and a processing device, operatively coupled with the memory device, to perform various operations including identifying multiple management units to be programmed, where one management unit contains memory cells from a die having one endurance metric and another management unit contains memory cells from a die having another endurance metric, and determining a value of a media endurance metric for each management unit. The operations further include determining, for each management unit, a respective endurance exhaustion parameter defined by a relationship media endurance metrics, and distributing operations to each management unit based on the endurance exhaustion parameter.
