17949862. DRIFT TUBE ELECTRODE ARRANGEMENT HAVING DIRECT CURRENT OPTICS simplified abstract (Applied Materials, Inc.)

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DRIFT TUBE ELECTRODE ARRANGEMENT HAVING DIRECT CURRENT OPTICS

Organization Name

Applied Materials, Inc.

Inventor(s)

Wai-Ming Tam of Manchester-by-the-Sea MA (US)

Klaus Becker of Kensington NH (US)

William Herron Park, Jr. of Marblehead MA (US)

Frank Sinclair of Hartland ME (US)

DRIFT TUBE ELECTRODE ARRANGEMENT HAVING DIRECT CURRENT OPTICS - A simplified explanation of the abstract

This abstract first appeared for US patent application 17949862 titled 'DRIFT TUBE ELECTRODE ARRANGEMENT HAVING DIRECT CURRENT OPTICS

Simplified Explanation

The apparatus described in the patent application includes a drift tube assembly with multiple drift tubes to guide an ion beam, a multi-gap configuration for acceleration, powered drift tubes receiving RF voltage signals, and a DC electrode assembly with a conductor line and DC voltage signals for the powered drift tubes.

  • The drift tube assembly consists of multiple drift tubes that guide an ion beam along a specific direction.
  • The multi-gap configuration within the drift tube assembly corresponds to several acceleration gaps for the ion beam.
  • At least one drift tube is powered and receives an RF voltage signal to control the ion beam.
  • The DC electrode assembly includes a conductor line within a resonator coil that delivers DC voltage signals to the powered drift tube.
  • A DC electrode arrangement connected to the conductor line is placed within the powered drift tube to further manipulate the ion beam.

Potential Applications

The technology described in the patent application could be applied in:

  • Particle accelerators
  • Mass spectrometry
  • Ion implantation processes

Problems Solved

This technology addresses issues related to:

  • Precise control and manipulation of ion beams
  • Efficient acceleration of ions
  • Enhanced performance in analytical instruments

Benefits

The benefits of this technology include:

  • Improved accuracy and precision in ion beam control
  • Enhanced efficiency in acceleration processes
  • Higher performance and reliability in ion-based applications

Potential Commercial Applications

The technology has potential commercial applications in:

  • Research institutions
  • Pharmaceutical companies
  • Semiconductor manufacturing industry

Possible Prior Art

One possible prior art related to this technology is the use of RF voltage signals in drift tube assemblies for ion beam manipulation. Another could be the integration of DC electrode assemblies for controlling ion beams in similar applications.

Unanswered Questions

How does this technology compare to existing ion beam manipulation methods?

The article does not provide a direct comparison with other ion beam manipulation techniques, leaving the reader wondering about the advantages and disadvantages of this technology in relation to existing methods.

What are the specific performance metrics improved by this innovation?

The article mentions enhanced performance, but it does not specify the exact performance metrics that are improved by this technology, leaving the reader curious about the quantitative benefits of the innovation.


Original Abstract Submitted

An apparatus may include a drift tube assembly having a plurality of drift tubes to conduct an ion beam along a beam propagation direction. The plurality of drift tubes may define a multi-gap configuration corresponding to a plurality of acceleration gaps, wherein at least one powered drift tube of the drift tube assembly is coupled to receive an RF voltage signal. The apparatus may also include a DC electrode assembly that includes a conductor line, arranged within a resonator coil that is coupled to receive a DC voltage signal into the at least one powered drift tube. The DC electrode assembly may also include a DC electrode arrangement, connected to the conductor line and disposed within the at least one powered drift tube.