17949091. FLUID VAPOR MIXING AND DELIVERY SYSTEM simplified abstract (Applied Materials, Inc.)
Contents
- 1 FLUID VAPOR MIXING AND DELIVERY SYSTEM
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 FLUID VAPOR MIXING AND DELIVERY SYSTEM - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Potential Commercial Applications
- 1.9 Possible Prior Art
- 1.10 Original Abstract Submitted
FLUID VAPOR MIXING AND DELIVERY SYSTEM
Organization Name
Inventor(s)
Edwin Velazquez of Union City CA (US)
FLUID VAPOR MIXING AND DELIVERY SYSTEM - A simplified explanation of the abstract
This abstract first appeared for US patent application 17949091 titled 'FLUID VAPOR MIXING AND DELIVERY SYSTEM
Simplified Explanation
The invention is a method and apparatus for delivering IPA vapor to a substrate processing chamber. It involves a controller, a liquid mass flow controller (LMFC) associated with a vaporizer, a mass flow controller (MFC) associated with the carrier gas, a mixing unit, and a drain circuit with flow paths and valves to control the delivery of the predetermined mixture to the chamber.
- Controller, LMFC, MFC, mixing unit, and drain circuit are key components.
- LMFC converts a first fluid to vapor, MFC controls carrier gas flow.
- Mixing unit combines vapor and carrier gas to create predetermined mixture.
- Drain circuit has flow paths and valves to control mixture delivery to chamber.
Potential Applications
The technology can be used in semiconductor manufacturing, chemical vapor deposition, and other industries requiring precise vapor delivery systems.
Problems Solved
Ensures accurate and controlled delivery of IPA vapor to the processing chamber, improving process efficiency and product quality.
Benefits
Enhanced process control, increased productivity, improved product quality, reduced waste, and cost savings.
Potential Commercial Applications
"Advanced Vapor Delivery System for Semiconductor Processing" can be a suitable title for this section. The technology can be applied in semiconductor fabrication facilities, research laboratories, and other high-tech manufacturing environments.
Possible Prior Art
There may be prior art related to vapor delivery systems in semiconductor processing equipment, but specific examples are not provided here.
Unanswered Questions
How does the invention improve process efficiency in substrate processing?
The invention ensures accurate and controlled delivery of IPA vapor to the processing chamber, which can lead to more consistent and reliable results in substrate processing.
What industries can benefit from this technology?
Industries such as semiconductor manufacturing, chemical vapor deposition, and other high-tech sectors can benefit from the precise vapor delivery system provided by this technology.
Original Abstract Submitted
A method and apparatus for delivering IPA vapor to a substrate processing chamber. In one aspect, the invention includes a controller, a liquid mass flow controller (LMFC) associated with a vaporizer to convert a first fluid to a vapor, a mass flow controller (MFC) associated with the carrier gas, a mixing unit to mix the vapor with the carrier gas to create the predetermined mixture and a drain circuit including a first flow path having a first valve between the mixing unit and a drain, a second flow path having a second valve between the mixing unit and the processing chamber, whereby the first flow path can be opened until the predetermined mixture is reached and thereafter, the second flow path can be opened allowing the predetermined mixture to be delivered to the chamber.
