17883678. Real-Time Detection of Deflections and Ruptures of EUV Pellicle Membranes simplified abstract (Intel Corporation)
Real-Time Detection of Deflections and Ruptures of EUV Pellicle Membranes
Organization Name
Inventor(s)
John Ferdinand Magana of San Jose CA (US)
Guojing Zhang of Saratoga CA (US)
Real-Time Detection of Deflections and Ruptures of EUV Pellicle Membranes - A simplified explanation of the abstract
This abstract first appeared for US patent application 17883678 titled 'Real-Time Detection of Deflections and Ruptures of EUV Pellicle Membranes
Simplified Explanation
The patent application is for a reticle assembly with a sensor assembly that monitors the pellicle attached to the reticle.
- Reticle assembly with a reticle and pellicle attached to a pellicle support frame
- Sensor assembly with optical and sensor components to monitor the pellicle
- Optical and sensor components are coupled to a controller
- Controller is further coupled to semiconductor process tools
Potential Applications
- Semiconductor manufacturing
- Lithography processes
Problems Solved
- Monitoring and maintaining the integrity of the pellicle
- Ensuring quality control in semiconductor manufacturing processes
Benefits
- Improved quality control in semiconductor manufacturing
- Enhanced reliability of reticle assemblies
- Increased efficiency in lithography processes
Original Abstract Submitted
The present disclosure is directed to a reticle assembly having a reticle and a pellicle attached to a pellicle support frame positioned on the reticle and includes a sensor assembly having optical and sensor components, which monitor the pellicle. The optical components and the sensor components of the sensor assembly may be coupled to a controller, which may be further coupled to one or more semiconductor process tools.
