17876465. SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)

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SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Wu-Wei Tsai of Taoyuan City (TW)

Yan-Yi Chen of Taipei City (TW)

Yu-Ming Hsiang of New Taipei City (TW)

Hai-Ching Chen of Hsinchu City (TW)

Chung-Te Lin of Tainan City (TW)

SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract

This abstract first appeared for US patent application 17876465 titled 'SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF

Simplified Explanation

The semiconductor structure described in the patent application includes several layers and structures, such as an active layer, a gate insulator layer, a gate layer, at least one charged layer, and contact structures. The charged layer is made of an oxide material and is positioned between the gate insulator layer and the active layer. The contact structures are placed over the active layer.

  • The semiconductor structure includes an active layer, gate insulator layer, gate layer, charged layer, and contact structures.
  • The charged layer is made of an oxide material and is located between the gate insulator layer and the active layer.
  • The contact structures are positioned over the active layer.

Potential Applications:

  • This semiconductor structure can be used in various electronic devices, such as transistors, integrated circuits, and microprocessors.
  • It can be applied in the field of telecommunications, where high-performance and efficient semiconductor devices are required.
  • The structure can be utilized in consumer electronics, such as smartphones, tablets, and laptops, to enhance their processing capabilities.

Problems Solved:

  • The charged layer helps improve the performance and efficiency of the semiconductor structure.
  • It provides better control over the flow of electric current within the device.
  • The structure helps reduce power consumption and heat generation.

Benefits:

  • The semiconductor structure offers enhanced performance and efficiency compared to conventional designs.
  • It enables faster and more reliable operation of electronic devices.
  • The structure helps reduce power consumption, leading to longer battery life in portable devices.
  • It improves the overall functionality and processing capabilities of electronic devices.


Original Abstract Submitted

A semiconductor structure includes an active layer, a first gate insulator layer disposed over the active layer, a first gate layer disposed over the gate insulator layer, at least one charged layer disposed between the first gate insulator layer and the active layer, and a pair of contact structures disposed over the active layer. The at least one charged layer includes an oxide material.