17867011. SEMICONDUCTOR DEVICES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
SEMICONDUCTOR DEVICES
Organization Name
Inventor(s)
Youn Seon Kang of Yongin-si (KR)
Eun Shoo Han of Hwaseong-si (KR)
SEMICONDUCTOR DEVICES - A simplified explanation of the abstract
This abstract first appeared for US patent application 17867011 titled 'SEMICONDUCTOR DEVICES
Simplified Explanation
The semiconductor device described in the patent application aims to improve the performance and reliability of a device by adjusting the arrangement of penetration patterns in an electrode support for the lower electrode. Here are the key points:
- The semiconductor device consists of multiple lower electrodes aligned on a substrate in different directions.
- A first electrode support is used to support the lower electrodes and includes multiple first penetration patterns.
- The first electrode support has a center region and an edge region along the periphery of the center region.
- In the center region, the first penetration patterns are spaced apart by a first interval.
- In the edge region, the first penetration patterns are spaced apart by a second interval, which is different from the first interval.
Potential applications of this technology:
- This semiconductor device can be used in various electronic devices, such as integrated circuits, microprocessors, and memory devices.
- It can be applied in industries like telecommunications, consumer electronics, automotive, and aerospace.
Problems solved by this technology:
- The adjusted arrangement of penetration patterns helps improve the performance and reliability of the semiconductor device.
- By spacing the penetration patterns differently in the center and edge regions, the device can achieve better electrical characteristics and reduce potential issues like signal interference.
Benefits of this technology:
- Improved performance and reliability of the semiconductor device.
- Enhanced electrical characteristics due to the optimized arrangement of penetration patterns.
- Reduction in signal interference, leading to better overall device functionality.
Original Abstract Submitted
There is provided a semiconductor device capable of improving performance and reliability of a device, by adjusting the arrangement of penetration patterns included in an electrode support for supporting the lower electrode. The semiconductor device includes a plurality of lower electrodes that are aligned with each other on a substrate along a first direction and a second direction different from the first direction, and a first electrode support that supports the lower electrodes, and includes a plurality of first penetration patterns, wherein the first electrode support includes a center region, and an edge region defined along a periphery of the center region, wherein the first penetration patterns include center penetration patterns that are spaced apart by a first interval in the center region, and wherein the first penetration patterns include edge penetration patterns that are spaced apart by a second interval different from the first interval in the edge region.
