17865589. ELECTRONIC DEVICE INCLUDING HOUSING AND METHOD FOR MANUFACTURING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
ELECTRONIC DEVICE INCLUDING HOUSING AND METHOD FOR MANUFACTURING THE SAME
Organization Name
Inventor(s)
Kyunghwan Song of Gyeonggi-do (KR)
Youngchun Kim of Gyeonggi-do (KR)
Hyuckki Lee of Gyeonggi-do (KR)
ELECTRONIC DEVICE INCLUDING HOUSING AND METHOD FOR MANUFACTURING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17865589 titled 'ELECTRONIC DEVICE INCLUDING HOUSING AND METHOD FOR MANUFACTURING THE SAME
Simplified Explanation
The abstract describes a housing design for an electronic device that includes two surfaces with irregularities formed by etching. The irregularities have different maximum heights and gradually increase or decrease from one surface to the other.
- The housing of an electronic device has two surfaces with irregularities formed by etching.
- The irregularities on each surface have different maximum heights.
- The maximum height of the irregularities gradually increases or decreases from one surface to the other.
Potential Applications:
- This housing design can be used in various electronic devices such as smartphones, tablets, laptops, etc.
- It can enhance the aesthetics and tactile experience of the device.
Problems Solved:
- Provides a unique and visually appealing design for electronic device housings.
- Offers a different tactile experience for users.
Benefits:
- Improved aesthetics and design appeal.
- Enhanced user experience with varying tactile sensations.
- Differentiation from competitors in the market.
Original Abstract Submitted
According to an embodiment of the disclosure, a housing of an electronic device may include a first surface including a first portion having an irregularity formed thereon and a second portion spaced apart from the first portion and having an irregularity formed thereon. The irregularities formed on the first surface may be formed by etching. A maximum height of the irregularity formed on the first portion may be different from a maximum height of the irregularity formed on the second portion. The maximum height of irregularities formed on the first surface may gradually increase or decrease from the first portion to the second portion.
