17859366. POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
Organization Name
Inventor(s)
Takafumi Miyaharu of Tochigi (JP)
POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 17859366 titled 'POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD
Simplified Explanation
The patent application describes a position detection apparatus that uses diffraction gratings to determine the relative positioning between two objects. Here are the key points:
- The apparatus captures an image of a moiré pattern created by overlapping first and second diffraction gratings.
- A processor analyzes the luminance distribution of the moiré pattern and calculates a phase measurement value.
- The processor then determines a phase shift amount to move the phase measurement value outside of a predetermined range that includes a discontinuous part of the phase.
- By applying the determined phase shift, the processor obtains a phase-shifted phase measurement value.
- The relative positioning between the first and second diffraction gratings is determined based on the phase-shifted phase measurement value.
Potential applications of this technology:
- Position detection in manufacturing processes, such as aligning components or measuring distances.
- Robotics and automation systems that require precise positioning.
- Optical systems that need accurate alignment and calibration.
Problems solved by this technology:
- Traditional position detection methods may be complex, expensive, or require additional equipment.
- The use of diffraction gratings and moiré patterns simplifies the position detection process.
- The phase shift technique allows for more accurate measurements and reduces errors caused by discontinuous phase values.
Benefits of this technology:
- Improved accuracy and precision in position detection.
- Cost-effective solution compared to alternative methods.
- Simplified setup and operation.
- Potential for integration into existing systems and equipment.
Original Abstract Submitted
A position detection apparatus comprises an obtaining unit that obtains an image of a moiré that occurs due to first and second diffraction gratings overlapping; and a processor configured to perform a periodic analysis of a luminance distribution of the obtained image of the moiré, obtain a phase measurement value of the luminance distribution, and obtain a relative positioning between the first and second diffraction gratings, wherein the processor determines a phase shift amount for making the obtained phase measurement value be a value outside of a predetermined range including a discontinuous part of the phase, and performs a phase shift to shift the obtained phase measurement value by the determined phase shift amount, and obtains the relative positioning based on the phase-shifted phase measurement value.
