17858924. METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING STEP USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING STEP USING THE SAME

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Ryunmin Heo of Suwon-si (KR)

Hyungrang Moon of Suwon-si (KR)

Minyoung Lee of Suwon-si (KR)

Minsoo Kim of Suwon-si (KR)

Youngkwon Kim of Suwon-si (KR)

Jaehyun Kim of Suwon-si (KR)

Changsoo Woo of Suwon-si (KR)

Jung Min Choi of Suwon-si (KR)

Moohyun Koh of Hwaseong-si (KR)

Jungah Kim of Hwaseong-si (KR)

Sungan Do of Hwaseong-si (KR)

Sang Won Bae of Suwon-si (KR)

Hoon Han of Hwaseong-si (KR)

SukKoo Hong of Hwaseong-si (KR)

METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING STEP USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 17858924 titled 'METAL CONTAINING PHOTORESIST DEVELOPER COMPOSITION, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING STEP USING THE SAME

Simplified Explanation

The abstract describes a metal-containing photoresist developer composition and a method of forming patterns using it. The composition includes an organic solvent and a heptagonal ring compound with at least one hydroxy group. The compound also has at least two double bonds in the ring.

• The metal-containing photoresist developer composition includes an organic solvent and a heptagonal ring compound substituted with at least one hydroxy group (—OH).
• The heptagonal ring compound has at least two double bonds in the ring.

Potential applications of this technology:

• Manufacturing of electronic devices
• Semiconductor fabrication
• Photolithography processes

Problems solved by this technology:

• Improved development of photoresist patterns
• Enhanced precision in forming patterns
• Increased efficiency in manufacturing processes

Benefits of this technology:

• Higher quality and accuracy in pattern formation
• Improved performance of electronic devices
• Increased productivity and cost-effectiveness in manufacturing

Original Abstract Submitted

A metal-containing photoresist developer composition, and a method of forming patterns including a step of developing using the same are provided. The metal-containing photoresist developer composition includes an organic solvent, and a heptagonal ring compound substituted with at least one hydroxy group (—OH). The heptagonal ring compound has at least two double bonds in the ring.