17851385. GAS DISTRIBUTION RING FOR PROCESS CHAMBER simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)

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GAS DISTRIBUTION RING FOR PROCESS CHAMBER

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor(s)

Po-Hsiang Wang of New Taipei City (TW)

Min-Chang Ching of Zhubei City (TW)

Kuo Liang Lu of Hsinchu City (TW)

Bo-Han Chu of Taipei City (TW)

GAS DISTRIBUTION RING FOR PROCESS CHAMBER - A simplified explanation of the abstract

This abstract first appeared for US patent application 17851385 titled 'GAS DISTRIBUTION RING FOR PROCESS CHAMBER

Simplified Explanation

The present disclosure describes an integrated chip processing tool that includes a gas distribution ring. This gas distribution ring is designed to extend along the perimeter of a process chamber and is made up of a lower ring and an upper ring.

  • The lower ring of the gas distribution ring has gas inlets arranged along its bottom surface and gas conveyance channels arranged along its upper surface. These gas conveyance channels are positioned directly over the gas inlets.
  • The upper ring is placed on top of the lower ring and covers the gas conveyance channels.
  • Gas outlets are arranged along the opposing ends of the gas conveyance channels.
  • The gas conveyance paths, which extend between the gas inlets and the gas outlets, have approximately equal lengths.

Potential applications of this technology:

  • This integrated chip processing tool can be used in the manufacturing of integrated circuits and other electronic devices.
  • It can be utilized in various semiconductor fabrication processes, such as deposition, etching, and cleaning.

Problems solved by this technology:

  • The gas distribution ring ensures a more uniform distribution of gas within the process chamber, leading to improved process control and uniformity.
  • The equal lengths of the gas conveyance paths help to prevent any variations or inconsistencies in the gas flow, resulting in more reliable and predictable processing.

Benefits of this technology:

  • The integrated chip processing tool provides better control over the gas distribution, leading to improved process performance and yield.
  • The equal lengths of the gas conveyance paths help to minimize any potential variations in the gas flow, ensuring consistent and reliable processing.
  • The gas distribution ring design simplifies the gas distribution system, making it easier to manufacture and maintain.


Original Abstract Submitted

The present disclosure relates to an integrated chip processing tool. The integrated chip processing tool includes a gas distribution ring configured to extend along a perimeter of a process chamber. The gas distribution ring includes a lower ring extending around the process chamber. The lower ring has a plurality of gas inlets arranged along a bottom surface of the lower ring and a plurality of gas conveyance channels arranged along an upper surface of the lower ring directly over the plurality of gas inlets. The gas distribution ring further includes an upper ring disposed on the upper surface of the lower ring and covering the plurality of gas conveyance channels. A plurality of gas outlets are arranged along opposing ends of the plurality of gas conveyance channels. A plurality of gas conveyance paths extending between the plurality of gas inlets and the plurality of gas outlets have approximately equal lengths.

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