17850257. APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING THE SAME, AND ARCING DIAGNOSIS METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING THE SAME, AND ARCING DIAGNOSIS METHOD

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Changsoon Lim of Hwaseong-si (KR)

Youngdo Kim of Hwaseong-si (KR)

Daewon Kang of Seoul (KR)

Chansoo Kang of Hwaseong-si (KR)

Kyunghyun Kim of Suwon-si (KR)

Sangki Nam of Seongnam-si (KR)

Kyunjin Lee of Suwon-si (KR)

Sungho Jang of Suwon-si (KR)

Jonghun Pi of Gunwi-gun (KR)

APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING THE SAME, AND ARCING DIAGNOSIS METHOD - A simplified explanation of the abstract

This abstract first appeared for US patent application 17850257 titled 'APPARATUS FOR ARCING DIAGNOSIS, PLASMA PROCESS EQUIPMENT INCLUDING THE SAME, AND ARCING DIAGNOSIS METHOD

Simplified Explanation

The patent application describes an apparatus that includes various sensors and a detector to detect arcing in a plasma process chamber. The sensors include VI sensors and an optical sensor, which sense harmonics and light intensity respectively, and output signals. The arcing detector determines whether arcing occurs based on these signals.

• The apparatus includes first and second VI sensors, an optical sensor, and an arcing detector.
• The first VI sensor is placed in a power filter or on a power supply line connected to a heater in the lower electrode of a process chamber.
• The first VI sensor senses a harmonic generated from a first power supply to the lower electrode and outputs a signal.
• The optical sensor measures the intensity of light generated from the process chamber and outputs a signal.
• The second VI sensor is placed on a power supply line connected to an upper electrode and senses a harmonic generated from a second power supply to the upper electrode, outputting a signal.
• The arcing detector determines whether arcing occurs based on one or more of the signals from the first VI sensor, the optical sensor, and the second VI sensor.

Potential Applications

• This technology can be applied in plasma processes, such as semiconductor manufacturing, where arcing can cause damage to the equipment and affect the quality of the products.
• It can be used in various industries that utilize plasma processes, including electronics, aerospace, and automotive.

Problems Solved

• Arcing in plasma processes can lead to equipment damage, reduced process efficiency, and product defects.
• Detecting arcing in real-time is crucial to prevent further damage and ensure the quality of the process and the products.

Benefits

• The apparatus provides a comprehensive approach to detect arcing in a plasma process chamber by combining VI sensors and an optical sensor.
• Real-time detection of arcing allows for immediate action to be taken to prevent equipment damage and product defects.
• By detecting arcing early, the apparatus helps to improve process efficiency and reduce downtime.

Original Abstract Submitted

An apparatus includes first and second VI sensors, an optical sensor, and an arcing detector. The first VI sensor is disposed in a power filter or on a power supply line connected to a heater disposed in a lower electrode of a process chamber in which a plasma process is performed. The first VI sensor senses a harmonic generated from a first power supply supplying power to the lower electrode and outputs a first signal. The optical sensor senses an intensity of light generated from the process chamber and outputs a second signal. The second VI sensor is disposed on a power supply line connected to an upper electrode and senses a harmonic generated from a second power supply supplying power to the upper electrode and outputs a third signal. The arcing detector determines whether arcing occurs based on one or more of the first, second, and third signals.