17748291. TRANSISTOR CAPABLE OF ELECTRICALLY CONTROLLING A THRESHOLD VOLTAGE AND SEMICONDUCTOR DEVICE INCLUDING THE TRANSISTOR simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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TRANSISTOR CAPABLE OF ELECTRICALLY CONTROLLING A THRESHOLD VOLTAGE AND SEMICONDUCTOR DEVICE INCLUDING THE TRANSISTOR

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Seonhaeng Lee of Hwaseong-si (KR)

Gangjun Kim of Gunpo-si (KR)

TRANSISTOR CAPABLE OF ELECTRICALLY CONTROLLING A THRESHOLD VOLTAGE AND SEMICONDUCTOR DEVICE INCLUDING THE TRANSISTOR - A simplified explanation of the abstract

This abstract first appeared for US patent application 17748291 titled 'TRANSISTOR CAPABLE OF ELECTRICALLY CONTROLLING A THRESHOLD VOLTAGE AND SEMICONDUCTOR DEVICE INCLUDING THE TRANSISTOR

Simplified Explanation

The abstract describes a transistor design that includes a gate structure, impurity regions, and a threshold voltage controlling line.

  • The transistor has a gate structure with a gate insulation layer and a gate electrode.
  • There are two impurity regions located at the upper portion of the substrate, one adjacent to each sidewall of the gate structure.
  • A first threshold voltage controlling line is positioned above the substrate and faces at least a portion of the first impurity region.
  • The first threshold voltage controlling line is made of a conductive material and extends in a direction perpendicular to the direction of the first impurity region.

Potential applications of this technology:

  • This transistor design can be used in various electronic devices, such as computers, smartphones, and tablets.
  • It can be applied in integrated circuits, allowing for faster and more efficient processing of data.
  • The design can be utilized in power amplifiers, memory devices, and other semiconductor devices.

Problems solved by this technology:

  • The transistor design helps to improve the performance and efficiency of electronic devices.
  • It addresses the need for smaller and more compact transistors, allowing for higher density integration.
  • The inclusion of the threshold voltage controlling line helps to enhance the control and stability of the transistor.

Benefits of this technology:

  • The transistor design offers improved speed and performance in electronic devices.
  • It allows for higher integration density, enabling the production of smaller and more powerful devices.
  • The inclusion of the threshold voltage controlling line enhances the control and stability of the transistor, leading to better overall device performance.


Original Abstract Submitted

A transistor includes: a gate structure disposed on a substrate, and including a gate insulation layer and a gate electrode; a first impurity region disposed at an upper portion of a substrate and adjacent to a first sidewall of the gate structure; a second impurity region disposed at an upper portion of the substrate and adjacent to a second sidewall opposite to the first sidewall of the gate structure; and a first threshold voltage controlling line spaced apart from the substrate, wherein the first threshold voltage controlling line faces at least a portion of the first impurity region, wherein the first threshold voltage controlling line includes a conductive material, and wherein the first threshold voltage controlling line extends in a direction that crosses a direction in which the first impurity region extends.