17747423. SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
Organization Name
Inventor(s)
Dong-Wan Kim of Hwaseong-si (KR)
Dong-Sik Park of Suwon-si (KR)
Jihoon Chang of Yongin-si (KR)
Hyeon-Woo Jang of Hwaseong-si (KR)
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17747423 titled 'SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
Simplified Explanation
The patent application describes a semiconductor device and its fabrication methods. The device includes a substrate with a peripheral block and cell blocks, each consisting of a cell center region, a cell edge region, and a cell middle region. Bit lines are present on each cell block, extending in a first direction. The bit lines are categorized into center bit lines, middle bit lines, and edge bit lines. The bit line has two lateral surfaces, one on each side, in a second direction. The first lateral surface runs straight along the first direction on the cell center region, cell middle region, and cell edge region. The second lateral surface runs straight along the first direction on the cell center region and cell edge region, but extends along a third direction (intersecting the first and second directions) on the cell middle region.
- The patent application describes a semiconductor device with a specific layout and structure.
- The device includes a substrate with peripheral and cell blocks, each having distinct regions.
- Bit lines are present on each cell block, categorized into center, middle, and edge bit lines.
- The bit line has two lateral surfaces, one straight along the first direction and the other extending along a third direction on the cell middle region.
Potential Applications
- This semiconductor device can be used in various electronic devices such as computers, smartphones, and tablets.
- It can be applied in memory chips, processors, and other integrated circuits.
Problems Solved
- The described layout and structure of the semiconductor device optimize its performance and functionality.
- The specific arrangement of bit lines allows for efficient data transfer and processing.
- The design ensures proper connectivity and reduces signal interference.
Benefits
- The semiconductor device offers improved performance and reliability.
- It enables faster data transfer and processing speeds.
- The optimized layout and structure enhance overall efficiency and functionality.
Original Abstract Submitted
Disclosed are semiconductor devices and their fabrication methods. The semiconductor device comprises a substrate including a peripheral block and cell blocks each including a cell center region, a cell edge region, and a cell middle region, and bit lines extending on each cell block in a first direction. The bit lines include center bit lines, middle bit lines, and edge bit lines. The bit line has first and second lateral surfaces opposite to each other in a second direction. The first lateral surface straightly extends along the first direction on the cell center region, the cell middle region, and the cell edge region. The second lateral surface straightly extends along the first direction on the cell center region and the cell edge region, and the second lateral surface extends along a third direction, that intersects the first direction and the second direction, on the cell middle region.
