17741590. POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
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Contents
- 1 POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Potential Applications
- 1.6 Problems Solved
- 1.7 Benefits
- 1.8 Original Abstract Submitted
POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME
Organization Name
Inventor(s)
Joonsong Park of Suwon-si (KR)
POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17741590 titled 'POLYPEPTIDE, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMING PATTERN USING THE SAME
Simplified Explanation
The abstract of the patent application describes a polypeptide that consists of three regions (A, B, and C), a photoresist composition that includes this polypeptide, and a method of forming patterns using this composition.
- The polypeptide has three distinct regions: A, B, and C.
- The photoresist composition contains the polypeptide.
- The method described in the patent application utilizes the photoresist composition to form patterns.
Potential Applications
- Semiconductor manufacturing: The photoresist composition can be used in the fabrication of microchips and other electronic devices.
- Nanotechnology: The method can be applied in the production of nanoscale structures and devices.
- Biotechnology: The polypeptide and photoresist composition may find applications in the field of biotechnology, such as in the development of biosensors or biochips.
Problems Solved
- Improved patterning: The method described in the patent application may offer a more efficient and precise way of creating patterns compared to existing techniques.
- Enhanced functionality: The polypeptide and photoresist composition may provide unique properties that enable the production of advanced electronic or biological devices.
Benefits
- Increased efficiency: The method may allow for faster and more accurate patterning, leading to improved manufacturing processes.
- Versatility: The polypeptide and photoresist composition can be used in various industries, expanding their potential applications.
- Novel properties: The polypeptide may possess unique characteristics that enhance the functionality and performance of the photoresist composition.
Original Abstract Submitted
A polypeptide including a region A, a region B, and a region C, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.
