17724861. META-OPTICAL DEVICE AND METHOD OF MANUFACTURING METASURFACE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
META-OPTICAL DEVICE AND METHOD OF MANUFACTURING METASURFACE
Organization Name
Inventor(s)
Jeongyub Lee of Yongin-si (KR)
META-OPTICAL DEVICE AND METHOD OF MANUFACTURING METASURFACE - A simplified explanation of the abstract
This abstract first appeared for US patent application 17724861 titled 'META-OPTICAL DEVICE AND METHOD OF MANUFACTURING METASURFACE
Simplified Explanation
The abstract describes a meta-optical device and a method of manufacturing a metasurface. The device consists of a substrate and a nanostructure, where the nanostructure has two portions that differ in diameter or period. The etch depth ratio between the two portions is approximately 0.9 to 1.1, and the nanostructure contains sulfur, fluorine, or fluorocarbon.
- The meta-optical device includes a substrate and a nanostructure.
- The nanostructure has two portions that differ in diameter or period.
- The etch depth ratio between the two portions is approximately 0.9 to 1.1.
- The nanostructure contains at least one of sulfur, fluorine, and fluorocarbon.
Potential Applications
This technology has potential applications in various fields, including:
- Optics and photonics research
- Optical communications
- Sensing and detection systems
- Imaging and microscopy
- Solar energy harvesting
Problems Solved
The meta-optical device and manufacturing method address several challenges, such as:
- Enhancing light-matter interactions
- Controlling and manipulating light at the nanoscale
- Improving optical device performance and efficiency
- Enabling new functionalities in optical systems
Benefits
The meta-optical device and its manufacturing method offer several benefits, including:
- High precision and control over nanostructure properties
- Enhanced optical properties and performance
- Versatility in designing and tailoring optical devices
- Compatibility with various materials and substrates
- Potential for miniaturization and integration into compact devices
Original Abstract Submitted
A meta-optical device and a method of manufacturing a metasurface are provided. The meta-optical device includes a substrate and a nanostructure, wherein the nanostructure includes a first portion and a second portion that differ in at least one of a diameter and a period, wherein a ratio of an etch depth of the second portion to an etch depth of the first portion is about 0.9 to about 1.1, and the nanostructure includes at least one of sulfur, fluorine, and fluorocarbon.
