17724344. SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)

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SEMICONDUCTOR DEVICE

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Jongmin Lee of Hwaseong-si (KR)

SEMICONDUCTOR DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17724344 titled 'SEMICONDUCTOR DEVICE

Simplified Explanation

The patent application describes a semiconductor device that includes a cell capacitor and a decoupling capacitor.

  • The cell capacitor consists of lower electrodes, an upper support layer pattern, a dielectric layer, and an upper electrode.
  • The decoupling capacitor consists of lower electrodes, an upper support layer pattern, a dielectric layer, and an upper electrode.
  • The lower electrodes of both capacitors are arranged in a honeycomb pattern at each vertex of a hexagon and the center of the hexagon.
  • The upper support layer pattern of the cell capacitor is connected to the upper sidewalls of the lower electrodes and has openings that define a first plate.
  • The upper support layer pattern of the decoupling capacitor is connected to the upper sidewalls of the lower electrodes and has openings that define a second plate with a different shape from the first plate.

Potential applications of this technology:

  • Semiconductor manufacturing industry
  • Electronics industry
  • Integrated circuit design

Problems solved by this technology:

  • Improved performance and efficiency of semiconductor devices
  • Enhanced decoupling capabilities for reducing noise and interference

Benefits of this technology:

  • Higher capacitance density
  • Improved signal integrity
  • Reduced power consumption
  • Enhanced overall device performance


Original Abstract Submitted

A semiconductor device may include a cell capacitor including first lower electrodes, a first upper support layer pattern, a first dielectric layer, and a first upper electrode. The decoupling capacitor may include second lower electrodes, a second upper support layer pattern, a second dielectric layer, and a second upper electrode. The first and second lower electrodes may be arranged in a honeycomb pattern at each vertex of a hexagon and a center of the hexagon. The first upper support layer pattern may be connected to upper sidewalls of the first lower electrodes. The first upper support layer pattern may correspond to a first plate defining first openings. The second upper support layer pattern may be connected to upper sidewalls of the second electrodes. The second upper support layer pattern may correspond to a second plate defining second openings having a shape different from a shape of the first opening.