17720872. EPITAXY STRUCTURE INCLUDING A PLURALITY OF SEMICONDUCTOR DEVICES simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
Contents
EPITAXY STRUCTURE INCLUDING A PLURALITY OF SEMICONDUCTOR DEVICES
Organization Name
Inventor(s)
Junhee Choi of Seongnam-si (KR)
Joosung Kim of Seongnam-si (KR)
Younghwan Park of Seongnam-si (KR)
Junghun Park of Yongin-si (KR)
Dongchul Shin of Suwon-si (KR)
Joohun Han of Hwaseong-si (KR)
EPITAXY STRUCTURE INCLUDING A PLURALITY OF SEMICONDUCTOR DEVICES - A simplified explanation of the abstract
This abstract first appeared for US patent application 17720872 titled 'EPITAXY STRUCTURE INCLUDING A PLURALITY OF SEMICONDUCTOR DEVICES
Simplified Explanation
The patent application describes an epitaxy structure that includes a substrate with a single crystal structure, a two-dimensional material layer on top of the substrate, and multiple nanorod light emitting devices on the two-dimensional material layer. Each nanorod light emitting device consists of a light emitting nanorod and a passivation film next to its sidewall.
- The epitaxy structure includes a substrate with a single crystal structure.
- A two-dimensional material layer is placed on top of the substrate.
- Multiple nanorod light emitting devices are positioned on the two-dimensional material layer.
- Each nanorod light emitting device has a nanorod shape extending vertically.
- Each nanorod light emitting device includes a light emitting nanorod.
- A passivation film is placed adjacent to the sidewall of the light emitting nanorod.
- The passivation film provides insulation.
Potential applications of this technology:
- Optoelectronic devices
- Solid-state lighting
- Display technology
- Photovoltaics
- Sensors
Problems solved by this technology:
- Enhances the performance and efficiency of light emitting devices
- Provides a compact and efficient structure for light emission
- Improves the stability and reliability of the devices
Benefits of this technology:
- Higher brightness and efficiency of light emission
- Improved device performance and reliability
- Compact and versatile design for various applications
Original Abstract Submitted
Provided is an epitaxy structure including a substrate having an upper surface, the upper surface having a single crystal structure, a two-dimensional material layer disposed on the upper surface of the substrate, and a plurality of nanorod light emitting devices disposed on an upper surface of the two-dimensional material layer, each of the plurality of nanorod light emitting devices having a nanorod shape extending in a vertical direction, wherein each of the plurality of nanorod light emitting devices includes a light emitting nanorod, and a passivation film disposed adjacent to a sidewall of the light emitting nanorod, the passivation film having insulation.
- SAMSUNG ELECTRONICS CO., LTD.
- Junhee Choi of Seongnam-si (KR)
- Kiho Kong of Suwon-si (KR)
- Nakhyun Kim of Yongin-si (KR)
- Joosung Kim of Seongnam-si (KR)
- Younghwan Park of Seongnam-si (KR)
- Junghun Park of Yongin-si (KR)
- Dongchul Shin of Suwon-si (KR)
- Eunsung Lee of Seoul (KR)
- Joohun Han of Hwaseong-si (KR)
- H01L33/04
- H01L27/15
- H01L33/24
- H01L33/44