17690058. System and Method for Fabricating a Semiconductor Device simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

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System and Method for Fabricating a Semiconductor Device

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Tai-Yi Chen of Hsinchu (TW)

Yung-Shun Chen of Taoyuan (TW)

Tse-Hung Chen of Taipei (TW)

Chih-Chiang Chang of Taipei (TW)

System and Method for Fabricating a Semiconductor Device - A simplified explanation of the abstract

This abstract first appeared for US patent application 17690058 titled 'System and Method for Fabricating a Semiconductor Device

Simplified Explanation

The patent application describes a system for fabricating a semiconductor device using data processors and computer instructions. The system performs various operations, including receiving a layout, extracting parasitic values, generating a modified netlist, performing a post-layout simulation, and fabricating the device.

  • The system receives a layout consisting of multiple elements.
  • Parasitic values associated with the layout are extracted to create a resistance and capacitance (RC) netlist.
  • A modified RC netlist is generated by adding the element names to the RC netlist.
  • A post-layout simulation is performed on the modified RC netlist to determine if the layout meets a predetermined specification.
  • If the layout meets the specification, a semiconductor device is fabricated based on the layout.

Potential Applications

  • Semiconductor manufacturing industry
  • Integrated circuit design and fabrication

Problems Solved

  • Ensures that a layout meets predetermined specifications before fabrication
  • Provides a more accurate representation of the layout by incorporating parasitic values
  • Streamlines the fabrication process by automating layout analysis and simulation

Benefits

  • Reduces the risk of manufacturing defects by verifying layout specifications
  • Improves the efficiency of semiconductor device fabrication
  • Enhances the accuracy of post-layout simulations by including parasitic values


Original Abstract Submitted

A system for fabricating a semiconductor device includes one or more data processors configured to perform operations commanded by instructions stored in a non-transitory computer-readable medium. The instructions include receiving a layout including a plurality of elements, extracting parasitic values associated with the layout to generate a resistance and capacitance (RC) netlist, generating a modified RC netlist by adding element names of the elements of the layout to the RC netlist, performing a post-layout simulation on the modified RC netlist to determine whether the layout meets a predetermined specification, and fabricating a semiconductor device based on the layout when it is determined that the layout meets the predetermined specification. The RC netlist includes the extracted parasitic values. The modified RC netlist includes a netlist table storing the element names and the extracted parasitic values.