17678233. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Samsung Electronics Co., Ltd.)
Contents
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Organization Name
Inventor(s)
Hyunwoong Hwang of Suwon-si (KR)
Hyunwoo Kim of Seongnam-si (KR)
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 17678233 titled 'SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Simplified Explanation
The patent application describes a substrate processing apparatus that is used to clean and process substrates. It includes various components such as cleaning nozzles, a bowl assembly, a discharge guide plate, and a discharge separation plate.
- The substrate support is designed to hold and rotate the substrate during processing.
- The first and second lower cleaning nozzles are positioned to spray different cleaning liquids onto the lower surface of the substrate.
- The bowl assembly surrounds the substrate support and has an annular accommodating space and inner and outer collection portions for collecting waste liquids.
- The discharge guide plate is placed under the substrate and extends outwardly from its circumference to guide the flow of liquids during the cleaning process.
- The discharge separation plate is movable within the bowl assembly and helps separate and control the flow of liquids.
Potential applications of this technology:
- Semiconductor manufacturing: The substrate processing apparatus can be used in the production of semiconductors to clean and prepare substrates for further processing.
- Display panel manufacturing: It can also be utilized in the manufacturing of display panels, such as LCD or OLED screens, to ensure the cleanliness and quality of the substrates.
- Solar cell production: The apparatus can be employed in the production of solar cells to clean and treat the substrates used in the manufacturing process.
Problems solved by this technology:
- Efficient cleaning: The apparatus provides multiple cleaning nozzles and an optimized design to ensure thorough and efficient cleaning of the substrate's lower surface.
- Waste liquid management: The bowl assembly and discharge separation plate help collect and control the flow of waste liquids, preventing contamination and facilitating proper disposal.
- Process control: The movable discharge separation plate allows for precise control of liquid flow, ensuring consistent and reliable processing results.
Benefits of this technology:
- Improved substrate cleanliness: The use of multiple cleaning nozzles and optimized liquid flow control leads to enhanced cleaning performance and higher substrate cleanliness.
- Enhanced process efficiency: The apparatus's design and features enable faster and more efficient substrate processing, reducing production time and costs.
- Waste management: The bowl assembly and discharge separation plate help manage waste liquids effectively, reducing the risk of contamination and facilitating environmentally friendly disposal.
Original Abstract Submitted
A substrate processing apparatus includes a substrate support configured to support and rotate a substrate, at least one first lower cleaning nozzle configured to spray a first cleaning liquid on a lower surface of the substrate, at least one second lower cleaning nozzle configured to spray a second cleaning liquid on the lower surface of the substrate, a bowl assembly disposed around the substrate support, the bowl assembly including a cup body providing an annular shaped accommodating space and inner and outer collection portions sequentially arranged in a radial direction in a lower portion of the cup body, an annular shaped discharge guide plate disposed in the receiving space of the bowl assembly under the substrate and extending outwardly from a circumference of the substrate, and a discharge separation plate provided within the receiving space of the bowl assembly to be movable upward and downward.
