17643534. PHOTOCURABLE COMPOSITION WITH ENHANCED THERMAL STABILITY simplified abstract (CANON KABUSHIKI KAISHA)
PHOTOCURABLE COMPOSITION WITH ENHANCED THERMAL STABILITY
Organization Name
Inventor(s)
Weijun Liu of Cedar Park TX (US)
PHOTOCURABLE COMPOSITION WITH ENHANCED THERMAL STABILITY - A simplified explanation of the abstract
This abstract first appeared for US patent application 17643534 titled 'PHOTOCURABLE COMPOSITION WITH ENHANCED THERMAL STABILITY
Simplified Explanation
The abstract describes a photocurable composition that includes a polymerizable material and a photoinitiator. The polymerizable material contains a specific type of monomer with a structure that includes an aromatic ring and at least one acrylate group. The composition can be cured using light.
- The patent application describes a photocurable composition that can be used for various applications.
- The composition includes a polymerizable material and a photoinitiator.
- The polymerizable material contains a specific type of monomer with a structure that includes an aromatic ring and at least one acrylate group.
- The composition can be cured using light, making it suitable for use in photopolymerization processes.
- The composition can be used in 3D printing, coatings, adhesives, and other applications where rapid curing is desired.
Potential Applications
- 3D printing
- Coatings
- Adhesives
- Rapid curing processes
Problems Solved
- Slow curing times in traditional polymerization processes
- Limited options for photocurable compositions with specific monomer structures
Benefits
- Rapid curing using light
- Versatile composition suitable for various applications
- Enhanced control over polymerization processes
Original Abstract Submitted
A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one first polymerizable monomer having a structure of Formula (1): (R)—Ar—(R)(1), with Ar being one or more substituted or unsubstituted aromatic rings; Rbeing a structure covalently bonded to Ar including at least one acrylate group; x being 1-4; and Rbeing —CH═CHor —CCH=CHcovalently bonded to Ar; y being 1-4.
