View source for 17586189. OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

=OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME=


==Organization Name==

[[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]]


[[Category:SAMSUNG ELECTRONICS CO., LTD.]]

==Inventor(s)==

[[:Category:Jin Yong Kim of Seoul (KR)|Jin Yong Kim of Seoul (KR)]][[Category:Jin Yong Kim of Seoul (KR)]]

[[:Category:Dae Hoon Han of Hwaseong-si (KR)|Dae Hoon Han of Hwaseong-si (KR)]][[Category:Dae Hoon Han of Hwaseong-si (KR)]]

[[:Category:Wook Rae Kim of Suwon-si (KR)|Wook Rae Kim of Suwon-si (KR)]][[Category:Wook Rae Kim of Suwon-si (KR)]]

[[:Category:Myung Jun Lee of Seongnam-si (KR)|Myung Jun Lee of Seongnam-si (KR)]][[Category:Myung Jun Lee of Seongnam-si (KR)]]

[[:Category:Gwang Sik Park of Hwaseong-si (KR)|Gwang Sik Park of Hwaseong-si (KR)]][[Category:Gwang Sik Park of Hwaseong-si (KR)]]

[[:Category:Sung Ho Jang of Hwaseong-si (KR)|Sung Ho Jang of Hwaseong-si (KR)]][[Category:Sung Ho Jang of Hwaseong-si (KR)]]

==OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17586189 titled 'OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

==Simplified Explanation==

The patent application describes an optical measurement apparatus that uses polarized light to generate a pupil image of a measurement target and detects a self-interference image generated by the interference of multiple beams split from the pupil image.

* The apparatus includes a light source unit that generates and outputs light.
* A polarized light generating unit generates polarized light from the light.
* An optical system generates a pupil image of a measurement target using the polarized light.
* A self-interference generating unit splits multiple beams from the pupil image.
* A detecting unit detects a self-interference image generated by the interference of the multiple beams.

Potential applications of this technology:

* Optical measurements in various fields such as microscopy, spectroscopy, and metrology.
* Non-destructive testing and inspection of materials and structures.
* Biomedical imaging and diagnostics.
* Semiconductor manufacturing and quality control.

Problems solved by this technology:

* Provides a more accurate and precise measurement of the measurement target.
* Enables non-invasive and non-destructive testing and inspection.
* Improves the resolution and sensitivity of imaging systems.
* Reduces the complexity and cost of optical measurement setups.

Benefits of this technology:

* Enhanced measurement accuracy and precision.
* Non-invasive and non-destructive testing.
* Improved resolution and sensitivity in imaging.
* Cost and complexity reduction in optical measurement setups.


==Original Abstract Submitted==

An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.



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[[Category:G01B11/30]]
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