17586189. OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
Organization Name
Inventor(s)
Dae Hoon Han of Hwaseong-si (KR)
Myung Jun Lee of Seongnam-si (KR)
Gwang Sik Park of Hwaseong-si (KR)
Sung Ho Jang of Hwaseong-si (KR)
OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract
This abstract first appeared for US patent application 17586189 titled 'OPTICAL MEASUREMENT APPARATUS, MEASURING METHOD USING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
Simplified Explanation
The patent application describes an optical measurement apparatus that uses polarized light to generate a pupil image of a measurement target and detects a self-interference image generated by the interference of multiple beams split from the pupil image.
- The apparatus includes a light source unit that generates and outputs light.
- A polarized light generating unit generates polarized light from the light.
- An optical system generates a pupil image of a measurement target using the polarized light.
- A self-interference generating unit splits multiple beams from the pupil image.
- A detecting unit detects a self-interference image generated by the interference of the multiple beams.
Potential applications of this technology:
- Optical measurements in various fields such as microscopy, spectroscopy, and metrology.
- Non-destructive testing and inspection of materials and structures.
- Biomedical imaging and diagnostics.
- Semiconductor manufacturing and quality control.
Problems solved by this technology:
- Provides a more accurate and precise measurement of the measurement target.
- Enables non-invasive and non-destructive testing and inspection.
- Improves the resolution and sensitivity of imaging systems.
- Reduces the complexity and cost of optical measurement setups.
Benefits of this technology:
- Enhanced measurement accuracy and precision.
- Non-invasive and non-destructive testing.
- Improved resolution and sensitivity in imaging.
- Cost and complexity reduction in optical measurement setups.
Original Abstract Submitted
An optical measurement apparatus includes a light source unit generating and outputting light, a polarized light generating unit generating polarized light from the light, an optical system generating a pupil image of a measurement target, using the polarized light, a self-interference generating unit generating multiple beams that are split from the pupil image, and a detecting unit detecting a self-interference image generated by interference of the multiple beams with each other.
