17542563. SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)

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SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS

Organization Name

INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor(s)

Rudy J. Wojtecki of San Jose CA (US)

Nicholas Anthony Lanzillo of Wynantskill NY (US)

PRASAD Bhosale of Albany NY (US)

SON Nguyen of Schenectady NY (US)

SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS - A simplified explanation of the abstract

This abstract first appeared for US patent application 17542563 titled 'SAM FORMULATIONS AND CLEANING TO PROMOTE QUICK DEPOSITIONS

Simplified Explanation

The abstract describes a patent application for self-assembled monolayers (SAM) formulations and cleaning methods to enhance deposition processes. The invention involves performing a hydrogen-based plasma clean on a structure consisting of a metal layer and a dielectric layer. A SAM solution, containing SAMs and a solvent, is applied to the structure to allow the SAMs to assemble on the metal layer. The structure is then rinsed with a rinse solution containing the solvent.

  • The invention focuses on improving deposition processes through the use of self-assembled monolayers (SAMs) and cleaning techniques.
  • A hydrogen-based plasma clean is performed on a structure consisting of a metal layer and a dielectric layer.
  • A SAM solution, containing SAMs and a solvent, is dispensed on the structure to facilitate the assembly of SAMs on the metal layer.
  • The structure is rinsed with a rinse solution containing the solvent to remove any excess SAM solution.

Potential Applications

  • Semiconductor manufacturing
  • Thin film deposition processes
  • Surface modification in various industries

Problems Solved

  • Enhances the efficiency and effectiveness of deposition processes
  • Improves the adhesion and uniformity of deposited layers
  • Reduces the risk of contamination during deposition

Benefits

  • Faster and more efficient deposition processes
  • Improved adhesion and uniformity of deposited layers
  • Reduced risk of contamination during deposition


Original Abstract Submitted

Embodiments of the invention provide self-assembled monolayers (SAM) formulations and cleaning to promote quick depositions. A hydrogen-based plasma clean is performed on a structure, the structure including a metal layer and a dielectric layer. A self-assembled monolayers (SAM) solution is dispensed on the structure, the SAM solution including SAMs and a solvent, the SAMs being configured to assemble on the metal layer. The structure is rinsed with a rinse solution including the solvent.

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