17510652. OPERATING METHOD OF ELECTRONIC DEVICE FOR SEMICONDUCTOR MEMORY MANUFACTURE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)

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OPERATING METHOD OF ELECTRONIC DEVICE FOR SEMICONDUCTOR MEMORY MANUFACTURE

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

USEONG Kim of Hwaseong-si (KR)

Bayram Yenikaya of San Jose CA (US)

Mindy Lee of San Jose CA (US)

Xin Zhou of San Jose CA (US)

HEE-JUN Lee of Seoul (KR)

WOO-YONG Cho of Hwaseong-si (KR)

OPERATING METHOD OF ELECTRONIC DEVICE FOR SEMICONDUCTOR MEMORY MANUFACTURE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17510652 titled 'OPERATING METHOD OF ELECTRONIC DEVICE FOR SEMICONDUCTOR MEMORY MANUFACTURE

Simplified Explanation

The operating method of this electronic device involves manufacturing a semiconductor device. Here is a simplified explanation of the abstract:

  • The electronic device receives a layout image of the semiconductor device.
  • It generates an intermediate image by creating assist features based on the main features of the layout image.
  • The process result is evaluated by performing a simulation based on the intermediate image.
  • The intermediate image is corrected by adjusting the shapes of the main features and/or the assist features based on the process result.

Potential applications of this technology:

  • Semiconductor manufacturing industry
  • Electronic device manufacturing companies

Problems solved by this technology:

  • Improves the accuracy of the manufacturing process for semiconductor devices
  • Reduces errors and defects in the final product

Benefits of this technology:

  • Enhanced efficiency in the manufacturing process
  • Improved quality control
  • Cost savings through reduced errors and rework


Original Abstract Submitted

Disclosed is an operating method of an electronic device for manufacture of a semiconductor device. The operating method includes receiving a layout image of the semiconductor device, generating an intermediate image by generating assist features based on main features of the layout image, evaluating a process result by performing simulation based on the intermediate image, and correcting the intermediate image by correcting shapes of the main features and/or the assist features of the intermediate image based on the process result.