View source for 17501318. INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

=INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME=


==Organization Name==

[[:Category:Samsung Electronics Co., Ltd.|Samsung Electronics Co., Ltd.]]


[[Category:Samsung Electronics Co., Ltd.]]

==Inventor(s)==

[[:Category:Doyoung Yoon of SUWON-SI (KR)|Doyoung Yoon of SUWON-SI (KR)]][[Category:Doyoung Yoon of SUWON-SI (KR)]]

[[:Category:Jeongho Ahn of SUWON-SI (KR)|Jeongho Ahn of SUWON-SI (KR)]][[Category:Jeongho Ahn of SUWON-SI (KR)]]

[[:Category:Dongryul Lee of SUWON-SI (KR)|Dongryul Lee of SUWON-SI (KR)]][[Category:Dongryul Lee of SUWON-SI (KR)]]

[[:Category:Dongchul Ihm of SUWON-SI (KR)|Dongchul Ihm of SUWON-SI (KR)]][[Category:Dongchul Ihm of SUWON-SI (KR)]]

[[:Category:Chungsam Jun of SUWON-SI (KR)|Chungsam Jun of SUWON-SI (KR)]][[Category:Chungsam Jun of SUWON-SI (KR)]]

==INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME - A simplified explanation of the abstract==


This abstract first appeared for US patent application 17501318 titled 'INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME

==Simplified Explanation==

The semiconductor wafer inspection system described in the patent application includes several components and controllers to inspect patterns on a wafer and cool it during the inspection process. 

* The system consists of a wafer chuck, which holds the wafer inside a chamber.
* A light source is used to emit light onto the wafer, allowing for pattern inspection.
* An inspection controller is responsible for controlling the operation of the light source.
* A cooling gas gun is positioned next to the light source and sprays a cooling gas onto the wafer's surface.
* A cooling controller supplies cooling air to the wafer chuck before the light is emitted and provides the cooling gas to the cooling gas gun.

Potential applications of this technology:

* Semiconductor manufacturing: This system can be used in the production of semiconductor wafers to inspect patterns and ensure their quality.
* Quality control: The system can be utilized in various industries to inspect and verify the quality of products with patterned surfaces.

Problems solved by this technology:

* Overheating: The cooling gas gun helps prevent the wafer from overheating during the inspection process, ensuring accurate results.
* Pattern inspection: The light source and inspection controller enable precise inspection of patterns on the wafer, identifying any defects or inconsistencies.

Benefits of this technology:

* Improved accuracy: The system's ability to cool the wafer and control the light source enhances the accuracy of pattern inspection.
* Efficient cooling: The cooling gas gun efficiently cools the wafer's surface, preventing overheating and potential damage.
* Enhanced quality control: By accurately inspecting patterns, the system helps ensure the overall quality of semiconductor wafers and other patterned products.


==Original Abstract Submitted==

A semiconductor wafer inspection system includes a wafer chuck disposed inside a chamber and on which a wafer is disposed, a light source configured to emit light for inspecting a pattern on the wafer to the wafer, an inspection controller configured to control the driving of the light source, a cooling gas gun disposed adjacent to the light source and configured to spray a cooling gas on a surface of the wafer, and a cooling controller configured to supply cooling air to the wafer chuck before light is emitted to the wafer and supply the cooling gas to the cooling gas gun.



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