17501318. INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)

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INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME

Organization Name

Samsung Electronics Co., Ltd.

Inventor(s)

Doyoung Yoon of SUWON-SI (KR)

Jeongho Ahn of SUWON-SI (KR)

Dongryul Lee of SUWON-SI (KR)

Dongchul Ihm of SUWON-SI (KR)

Chungsam Jun of SUWON-SI (KR)

INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 17501318 titled 'INSPECTION SYSTEM OF SEMICONDUCTOR WAFER AND METHOD OF DRIVING THE SAME

Simplified Explanation

The semiconductor wafer inspection system described in the patent application includes several components and controllers to inspect patterns on a wafer and cool it during the inspection process.

  • The system consists of a wafer chuck, which holds the wafer inside a chamber.
  • A light source is used to emit light onto the wafer, allowing for pattern inspection.
  • An inspection controller is responsible for controlling the operation of the light source.
  • A cooling gas gun is positioned next to the light source and sprays a cooling gas onto the wafer's surface.
  • A cooling controller supplies cooling air to the wafer chuck before the light is emitted and provides the cooling gas to the cooling gas gun.

Potential applications of this technology:

  • Semiconductor manufacturing: This system can be used in the production of semiconductor wafers to inspect patterns and ensure their quality.
  • Quality control: The system can be utilized in various industries to inspect and verify the quality of products with patterned surfaces.

Problems solved by this technology:

  • Overheating: The cooling gas gun helps prevent the wafer from overheating during the inspection process, ensuring accurate results.
  • Pattern inspection: The light source and inspection controller enable precise inspection of patterns on the wafer, identifying any defects or inconsistencies.

Benefits of this technology:

  • Improved accuracy: The system's ability to cool the wafer and control the light source enhances the accuracy of pattern inspection.
  • Efficient cooling: The cooling gas gun efficiently cools the wafer's surface, preventing overheating and potential damage.
  • Enhanced quality control: By accurately inspecting patterns, the system helps ensure the overall quality of semiconductor wafers and other patterned products.


Original Abstract Submitted

A semiconductor wafer inspection system includes a wafer chuck disposed inside a chamber and on which a wafer is disposed, a light source configured to emit light for inspecting a pattern on the wafer to the wafer, an inspection controller configured to control the driving of the light source, a cooling gas gun disposed adjacent to the light source and configured to spray a cooling gas on a surface of the wafer, and a cooling controller configured to supply cooling air to the wafer chuck before light is emitted to the wafer and supply the cooling gas to the cooling gas gun.