17491012. TWO-TERMINAL MEMORY DEVICE, A METHOD FOR MANUFACTURING THE SAME, AND A SEMICONDUCTOR DEVICE INCLUDING A TWO-TERMINAL MEMORY DEVICE simplified abstract (Hyundai Motor Company)

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TWO-TERMINAL MEMORY DEVICE, A METHOD FOR MANUFACTURING THE SAME, AND A SEMICONDUCTOR DEVICE INCLUDING A TWO-TERMINAL MEMORY DEVICE

Organization Name

Hyundai Motor Company

Inventor(s)

Ui-Yeon Won of Ansan-si (KR)

Jong-Seok Lee of Suwon-si (KR)

Sang-Hyeok Yang of Suwon-si (KR)

TWO-TERMINAL MEMORY DEVICE, A METHOD FOR MANUFACTURING THE SAME, AND A SEMICONDUCTOR DEVICE INCLUDING A TWO-TERMINAL MEMORY DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17491012 titled 'TWO-TERMINAL MEMORY DEVICE, A METHOD FOR MANUFACTURING THE SAME, AND A SEMICONDUCTOR DEVICE INCLUDING A TWO-TERMINAL MEMORY DEVICE

Simplified Explanation

The abstract describes a two-terminal memory device that includes a substrate, a source, a drain, a ferroelectric layer, and an extended drain. The device can be used as a cross-point type and neuromorphic device with multiple resistance levels.

  • The two-terminal memory device has a substrate with a source and a drain formed on its upper surface.
  • A ferroelectric layer is connected to the source and the drain and is located between them.
  • An extended drain is formed from the drain and is laminated on the ferroelectric layer.
  • The device can be used as a cross-point type and neuromorphic device.
  • It is capable of implementing multi-resistance levels with multi-layer switchable resistance layers.

Potential Applications

This technology has potential applications in various fields, including:

  • Memory devices
  • Neuromorphic computing
  • Cross-point memory arrays

Problems Solved

The two-terminal memory device solves several problems, such as:

  • Limited resistance levels in memory devices
  • Inefficient neuromorphic computing
  • Complex circuitry in cross-point memory arrays

Benefits

The benefits of this technology include:

  • Increased resistance levels in memory devices
  • Improved efficiency in neuromorphic computing
  • Simplified circuitry in cross-point memory arrays


Original Abstract Submitted

A two-terminal memory device including: a substrate; a source and a drain formed to face each other on an upper surface of the substrate; a ferroelectric layer connected to the source and the drain and formed between the source and the drain; and an extended drain extending from the drain and laminated on the ferroelectric layer. The two-terminal memory device may be applied as a cross-point type and neuromorphic device capable of implementing multi-resistance levels with multi-layer switchable resistance layers.