17461715. IN-SITU APPARATUS FOR DETECTING ABNORMALITY IN PROCESS TUBE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

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IN-SITU APPARATUS FOR DETECTING ABNORMALITY IN PROCESS TUBE

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Yu-Jen Yang of Hsinchu (TW)

Chung-Pin Chou of Hsinchu (TW)

Kai-Lin Chuang of Hsinchu (TW)

Yan-Cheng Chen of Hsinchu (TW)

Sheng-Ching Kao of Hsinchu (TW)

Jun-Xiu Liu of Hsinchu (TW)

IN-SITU APPARATUS FOR DETECTING ABNORMALITY IN PROCESS TUBE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17461715 titled 'IN-SITU APPARATUS FOR DETECTING ABNORMALITY IN PROCESS TUBE

Simplified Explanation

The abstract describes a process tube device that can detect the presence of external materials in a fluid flowing through a tube. The device eliminates the need for a separate inspection device by detecting the materials in-situ. It uses two methods of detection: direct measurement using a light detecting sensor, and indirect measurement using a sensor based on Doppler shift.

  • The process tube device detects external materials in a fluid flowing through a tube.
  • It eliminates the need for a separate inspection device.
  • The device uses two methods of detection: direct measurement with a light detecting sensor, and indirect measurement with a Doppler shift sensor.
  • The direct measurement method uses reflected or refracted light to detect external materials.
  • The indirect measurement method measures the velocity of the fluid flowing in the tube using a Doppler shift sensor.
  • The device can be used in various applications where the presence of external materials in a fluid needs to be detected.

Potential Applications

  • Semiconductor manufacturing: Detecting contaminants in fluids used in wafer processing.
  • Pharmaceutical industry: Identifying impurities in drug manufacturing processes.
  • Food and beverage industry: Ensuring the purity of fluids used in production.
  • Oil and gas industry: Detecting foreign materials in pipelines and refining processes.

Problems Solved

  • Eliminates the need for a separate inspection device, saving time and resources.
  • Enables in-situ detection of external materials, reducing the risk of contamination.
  • Provides multiple methods of detection, increasing accuracy and reliability.

Benefits

  • Streamlines the detection process by integrating it into the fluid flow system.
  • Reduces the risk of product contamination by detecting external materials in real-time.
  • Improves efficiency by eliminating the need for manual inspection after fluid application.
  • Enhances quality control by detecting impurities or foreign materials at an early stage.


Original Abstract Submitted

A process tube device can detect the presence of any external materials that may reside within a fluid flowing in the tube. The process tube device detects the external materials in-situ which obviates the need for a separate inspection device to inspect the surface of a wafer after applying fluid on the surface of the wafer. The process tube device utilizes at least two methods of detecting the presence of external materials. The first is the direct measurement method in which a light detecting sensor is used. The second is the indirect measurement method in which a sensor utilizing the principles of Doppler shift is used. Here, contrary to the first method that at least partially used reflected or refracted light, the second method uses a Doppler shift sensor to detect the presence of the external material by measuring the velocity of the fluid flowing in the tube.

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