17461688. APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
- 1 APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE
- 1.1 Organization Name
- 1.2 Inventor(s)
- 1.3 APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE - A simplified explanation of the abstract
- 1.4 Simplified Explanation
- 1.5 Abstract
- 1.6 Patent/Innovation
- 1.7 Potential Applications
- 1.8 Problems Solved
- 1.9 Benefits
- 1.10 Original Abstract Submitted
APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Huicheng Chang of Hsinchu (TW)
APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE - A simplified explanation of the abstract
This abstract first appeared for US patent application 17461688 titled 'APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE
Simplified Explanation
Abstract
A temperature measuring apparatus is described that uses a light emitting source and a detector to measure the temperature of a substrate during a thermal process. The apparatus improves the signal to noise ratio by using a polarizer to polarize the laser pulses and controlling the angle at which the pulses are applied to the substrate.
Patent/Innovation
- The apparatus uses a light emitting source to emit laser pulses onto the substrate.
- A detector receives the reflected laser pulses and emission signals from the substrate's surface.
- The apparatus determines the temperature of the substrate using the received laser pulses and emission signals.
- A polarizer is used to polarize the laser pulses to have a S polarization, improving the signal to noise ratio of the reflected pulses.
- The angle at which the polarized laser pulses are applied to the substrate can be controlled to further enhance the signal to noise ratio at the detector's end.
Potential Applications
- Temperature measurement during thermal processes in various industries such as semiconductor manufacturing, metal processing, and chemical reactions.
- Monitoring temperature changes in materials during research and development.
- Quality control in manufacturing processes that require precise temperature control.
Problems Solved
- Provides a more accurate and reliable method for measuring the temperature of a substrate during a thermal process.
- Improves the signal to noise ratio of the reflected laser pulses, resulting in more precise temperature measurements.
- Allows for better control and monitoring of temperature changes in various industrial processes.
Benefits
- Increased accuracy and reliability in temperature measurements.
- Improved signal to noise ratio for more precise measurements.
- Enhanced control and monitoring of temperature changes during thermal processes.
- Potential for cost savings and improved efficiency in industrial processes.
Original Abstract Submitted
A temperature measuring apparatus for measuring a temperature of a substrate is described. A light emitting source that emits light signals such as laser pulses are applied to the substrate. A detector on the other side of the light emitting source receives the reflected laser pulses. The detector further receives emission signals associated with temperature or energy density that is radiated from the surface of the substrate. The temperature measuring apparatus determines the temperature of the substrate during a thermal process using the received laser pulses and the emission signals. To improve the signal to noise ratio of the reflected laser pulses, a polarizer may be used to polarize the laser pulses to have a S polarization. The angle in which the polarized laser pulses are applied towards the substrate may also be controlled to enhance the signal to noise ratio at the detector's end.
