17459043. Systems, Methods, and Semiconductor Devices simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
Contents
Systems, Methods, and Semiconductor Devices
Organization Name
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Inventor(s)
Systems, Methods, and Semiconductor Devices - A simplified explanation of the abstract
This abstract first appeared for US patent application 17459043 titled 'Systems, Methods, and Semiconductor Devices
Simplified Explanation
The patent application describes a method of manufacturing a semiconductor device using laser annealing. The method involves determining the reflectivity of different anneal regions on a wafer and adjusting the power of laser shots accordingly. The temperature of the anneal regions is measured during the process.
- The method involves determining the reflectivity of anneal regions on a wafer.
- Laser shots are performed on the anneal regions based on their reflectivity.
- The power of the laser shots is adjusted according to the reflectivity of the anneal regions.
- The temperature of the anneal regions is measured during the process.
Potential Applications
- Manufacturing of semiconductor devices
- Semiconductor fabrication processes
Problems Solved
- Controlling the power of laser shots during annealing processes
- Ensuring consistent temperature in different anneal regions
Benefits
- Improved control over the annealing process
- Enhanced uniformity in the temperature of anneal regions
- Increased efficiency in semiconductor manufacturing
Original Abstract Submitted
A method of manufacturing a semiconductor device includes: determining a first reflectivity of a first anneal region on a wafer; determining a second reflectivity of a second anneal region on the wafer, performing a first laser shot on the first anneal region, measuring a first temperature of the first anneal region, and performing a second laser shot on a second anneal region. A power of the first laser shot is set in accordance with the first reflectivity. A power of the second laser shot is set in accordance with the second reflectivity.
