US Patent Application 18351571. SUBSTRATE STAGE AND SUBSTRATE PROCESSING SYSTEM USING THE SAME simplified abstract

From WikiPatents
Revision as of 11:09, 9 November 2023 by Wikipatents (talk | contribs) (Creating a new page)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Jump to navigation Jump to search

SUBSTRATE STAGE AND SUBSTRATE PROCESSING SYSTEM USING THE SAME

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.


Inventor(s)

Yu-Huan Chen of Hsinchu City (TW)

Yu-Chih Huang of Hsinchu City (TW)

Ya-An Peng of Taoyuan City (TW)

Shang-Chieh Chien of New Taipei City (TW)

Li-Jui Chen of Hsinchu City (TW)

Heng-Hsin Liu of New Taipei City (TW)

SUBSTRATE STAGE AND SUBSTRATE PROCESSING SYSTEM USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18351571 titled 'SUBSTRATE STAGE AND SUBSTRATE PROCESSING SYSTEM USING THE SAME

Simplified Explanation

The patent application describes a semiconductor substrate stage used for carrying a substrate.

  • The stage includes a base layer, a magnetic shielding layer, a carrier layer, a receiver, a storage layer, and a magnetic shielding element.
  • The magnetic shielding layer is placed on top of the base layer.
  • The carrier layer is placed on top of the magnetic shielding layer.
  • The receiver is placed on top of the carrier layer.
  • The storage layer is located between the base layer and the magnetic shielding layer.
  • The magnetic shielding element surrounds the receiver on the carrier layer.
  • The purpose of the magnetic shielding layer and element is to protect the receiver from external magnetic interference.
  • The stage is designed to provide a stable and secure platform for carrying a semiconductor substrate.


Original Abstract Submitted

A semiconductor substrate stage for carrying a substrate is provided. The semiconductor substrate stage includes a base layer, a magnetic shielding layer disposed on the base layer, a carrier layer disposed on the magnetic shielding layer, a receiver disposed on the carrier layer, a storage layer disposed between the base layer and the magnetic shielding layer, and a magnetic shielding element disposed on the carrier layer and surrounding the receiver.

Retrieved from "http://wikipatents.org/index.php?title=US_Patent_Application_18351571._SUBSTRATE_STAGE_AND_SUBSTRATE_PROCESSING_SYSTEM_USING_THE_SAME_simplified_abstract&oldid=6708"