17984500. SUBSTRATE PROCESSING APPARATUS simplified abstract (Samsung Display Co., Ltd.)
Contents
SUBSTRATE PROCESSING APPARATUS
Organization Name
Inventor(s)
Junggon Kim of Hwaseong-si (KR)
Min-Gyu Park of Cheonan-si (KR)
Heeyong Lee of Seongnam-si (KR)
SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 17984500 titled 'SUBSTRATE PROCESSING APPARATUS
Simplified Explanation
The abstract describes a substrate processing apparatus that includes a chamber, a nozzle assembly, and a lifting module. The chamber maintains a vacuum state and has an upper wall positioned on the working space. The nozzle assembly is positioned in the working space and includes nozzles. The lifting module includes a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.
- The substrate processing apparatus includes a chamber with a vacuum state and an upper wall.
- A nozzle assembly with nozzles is positioned in the working space of the chamber.
- A lifting module outside the chamber includes a frame and a lifting part that lifts the frame.
- At least one shaft passes through the upper wall and connects the frame and the nozzle assembly.
- The shaft extends in the direction of gravity.
Potential Applications
- Semiconductor manufacturing: The substrate processing apparatus can be used in the production of semiconductors.
- Thin film deposition: The apparatus can be utilized for depositing thin films on various substrates.
- Surface treatment: It can be employed for surface treatment processes such as cleaning or etching.
Problems Solved
- Maintaining a vacuum state: The chamber of the apparatus ensures a vacuum environment for effective substrate processing.
- Precise positioning: The lifting module allows accurate positioning of the nozzle assembly for optimal substrate treatment.
- Efficient substrate processing: The apparatus enables efficient and controlled processing of substrates.
Benefits
- Improved productivity: The apparatus allows for faster and more efficient substrate processing, leading to increased productivity.
- Enhanced precision: The lifting module enables precise positioning of the nozzle assembly, resulting in improved accuracy and quality of substrate treatment.
- Versatility: The substrate processing apparatus can be utilized in various applications within the semiconductor industry and other fields requiring substrate processing.
Original Abstract Submitted
A substrate processing apparatus may include a chamber having a working space, maintaining a vacuum state, and including an upper wall positioned on the working space, a nozzle assembly positioned in the working space, and including nozzles, and a lifting module including a frame positioned outside of the chamber, a lifting part that lifts the frame, and at least one shaft passing through the upper wall, connected to each of the frame and the nozzle assembly, and extending in a direction of gravity.
