17520933. FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS simplified abstract (International Business Machines Corporation)
Contents
FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS
Organization Name
International Business Machines Corporation
Inventor(s)
Daniel Schmidt of Niskayuna NY (US)
FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS - A simplified explanation of the abstract
This abstract first appeared for US patent application 17520933 titled 'FEED-FORWARD AND UTILIZATION OF HEIGHT INFORMATION FOR METROLOGY TOOLS
Simplified Explanation
The patent application describes methods and systems for configuring a metrology tool. Here is a simplified explanation of the abstract:
- A processor receives a height map of a sample from a device that generates wafer height maps.
- The height map provides information about the heights of multiple features on the sample's surface.
- These features are located on different focal planes.
- Based on the height map, the processor generates settings for the metrology tool.
Potential Applications:
- Semiconductor manufacturing: This technology can be used in the production of semiconductor wafers to configure metrology tools for accurate measurements of features on the wafer's surface.
- Quality control: The metrology tool settings generated based on the height map can be used to ensure the quality and consistency of various products that require precise measurements.
Problems Solved:
- Configuring metrology tools: The technology solves the problem of manually configuring metrology tools by automating the process based on the height map of the sample.
- Accurate measurements: By generating settings based on the height map, the technology helps in obtaining accurate measurements of features on the sample's surface.
Benefits:
- Efficiency: Automating the configuration process saves time and effort compared to manual configuration of metrology tools.
- Precision: The generated settings based on the height map help in achieving precise measurements, improving the overall quality control process.
- Adaptability: The technology can be used with different samples and surfaces, allowing for flexibility in various industries.
Original Abstract Submitted
Methods and systems for configuring a metrology tool are described. A processor can receive a height map of a sample from an apparatus configured to generate wafer height maps. The received height map can indicate height information of a plurality of features on a surface of the sample. The plurality of features can be located on a plurality of focal planes. The processor can generate settings for the metrology tool based on the height map of the sample.