18047342. PELLICLE AND METHOD OF USING THE SAME simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

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PELLICLE AND METHOD OF USING THE SAME

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor(s)

Chue San Yoo of Hsinchu (TW)

Hsin-Chang Lee of Hsinchu (TW)

Pei-Cheng Hsu of Hsinchu (TW)

Yun-Yue Lin of Hsinchu (TW)

PELLICLE AND METHOD OF USING THE SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18047342 titled 'PELLICLE AND METHOD OF USING THE SAME

Simplified Explanation

The abstract describes a pellicle frame that includes a check valve and a single recess for a gasket. The check valve allows gas flow from the inside to the outside of the pellicle, while the gasket fits within the recess.

  • The pellicle frame has a check valve that permits gas flow from the inside to the outside.
  • The frame has a single recess on its bottom surface.
  • A gasket is designed to fit within the single recess.

Potential Applications

  • Semiconductor manufacturing: The pellicle frame can be used in the production of semiconductor chips to protect them from contaminants.
  • Optical devices: The frame can be utilized in optical devices such as lenses or mirrors to prevent dust or particles from affecting their performance.

Problems Solved

  • Contamination prevention: The check valve and gasket combination helps to maintain a clean environment by allowing gas flow while keeping out contaminants.
  • Simplified design: The single recess and gasket provide a straightforward and efficient solution for sealing the pellicle frame.

Benefits

  • Enhanced protection: The check valve ensures that gas can escape from the inside, preventing pressure buildup and potential damage to the pellicle.
  • Easy installation: The gasket fitting into the single recess simplifies the assembly process, saving time and effort.


Original Abstract Submitted

A pellicle frame includes a check valve, wherein the check valve is configured to permit gas flow from an interior of the pellicle to an exterior of the pellicle. The pellicle frame further includes a bottom surface of the frame defines only a single recess therein. The pellicle frame further includes a gasket configured to fit within the single recess.