US Patent Application 18232834. PLASMA PROCESSING APPARATUS simplified abstract
Contents
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Toshimasa Kobayashi of Miyagi (JP)
Kazuki Takahashi of Miyagi (JP)
PLASMA PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18232834 titled 'PLASMA PROCESSING APPARATUS
Simplified Explanation
The patent application describes a plasma processing apparatus that is used for performing a plasma process on a substrate.
- The apparatus includes a processing container where a mounting stage is provided to hold the substrate during the plasma process.
- An exhaust passage is also included, which surrounds the mounting stage and allows the gas containing by-products from the plasma process to flow out.
- The apparatus further includes a first adsorption member, which is positioned along the inner wall surface of the exhaust passage.
- The surface of the first adsorption member is roughened to enhance its ability to adsorb the by-products released during the plasma process.
Original Abstract Submitted
A plasma processing apparatus includes: a processing container in which a mounting stage mounted with a substrate is provided and a plasma process is performed on the substrate; an exhaust passage which is provided around the mounting stage and through which a gas containing a by-product released by the plasma process flows; and a first adsorption member which is arranged along an inner wall surface of the exhaust passage and of which a surface is roughened to adsorb the by-product.
