US Patent Application 18234147. MAGNETORESISTANCE EFFECT ELEMENT simplified abstract

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MAGNETORESISTANCE EFFECT ELEMENT

Organization Name

TDK CORPORATION

Inventor(s)

Tomoyuki Sasaki of Tokyo (JP)

MAGNETORESISTANCE EFFECT ELEMENT - A simplified explanation of the abstract

This abstract first appeared for US patent application 18234147 titled 'MAGNETORESISTANCE EFFECT ELEMENT

Simplified Explanation

The patent application describes a magnetoresistance effect element consisting of two ferromagnetic metal layers and a tunnel barrier layer in between.

  • The tunnel barrier layer is made up of a chemical compound expressed as ABO and has a disordered spinel structure.
  • A represents either Mg or Zn, which are divalent cations.
  • B represents a trivalent cation that can be Al, Ga, or In, among others.
  • The innovation lies in the specific composition and structure of the tunnel barrier layer, which enhances the magnetoresistance effect in the element.


Original Abstract Submitted

A magnetoresistance effect element has a first ferromagnetic metal layer, a second ferromagnetic metal layer, and a tunnel barrier layer that is sandwiched between the first and second ferromagnetic metal layers, the tunnel barrier layer is expressed by a chemical formula of ABO, and has a spinel structure in which cations are arranged in a disordered manner, A represents a divalent cation that is either Mg or Zn, and B represents a trivalent cation that includes a plurality of elements selected from the group consisting of Al, Ga, and In.