US Patent Application 18361254. SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES simplified abstract

SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES

Organization Name

Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor(s)

Tai-Yu Chen of Hsinchu (TW)

Sagar Deepak Khivsara of Hsinchu (TW)

Kuo-An Liu of Hsinchu (TW)

Chieh Hsieh of Hsinchu (TW)

Shang-Chieh Chien of Hsinchu (TW)

Gwan-Sin Chang of Hsinchu (TW)

Kai Tak Lam of Hsinchu (TW)

Li-Jui Chen of Hsinchu (TW)

Heng-Hsin Liu of Hsinchu (TW)

Chung-Wei Wu of Hsinchu (TW)

Zhiqiang Wu of Hsinchu (TW)

SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES - A simplified explanation of the abstract

This abstract first appeared for US patent application 18361254 titled 'SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES

Simplified Explanation

- The patent application describes a photolithography system that uses tin droplets to generate extreme ultraviolet radiation for photolithography. - The system irradiates the tin droplets with a laser, causing them to become a plasma and emit extreme ultraviolet radiation. - One aspect of the invention is the ability of the system to sense contamination of a collector mirror by the tin droplets. - The system then adjusts the flow of a buffer fluid to reduce the contamination of the collector mirror. - The innovation aims to improve the efficiency and effectiveness of photolithography processes by reducing contamination and maintaining the quality of the collector mirror.

Original Abstract Submitted

A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.