View source for US Patent Application 18362760. SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM simplified abstract

=SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM=


==Organization Name==

[[:Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.|TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]


[[Category:TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.]]

==Inventor(s)==

[[:Category:Kai-Chin Wei of Hsinchu (TW)|Kai-Chin Wei of Hsinchu (TW)]][[Category:Kai-Chin Wei of Hsinchu (TW)]]

[[:Category:Che-fu Chen of Hsinchu (TW)|Che-fu Chen of Hsinchu (TW)]][[Category:Che-fu Chen of Hsinchu (TW)]]

==SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18362760 titled 'SEMICONDUCTOR PROCESS CHAMBER CONTAMINATION PREVENTION SYSTEM

==Simplified Explanation==

The patent application describes a semiconductor process system that includes a chamber for semiconductor processing and a pump to extract gases from the chamber.
* The system includes fluid nozzles that prevent particles from flowing back into the chamber when the pump stops working.
* The fluid nozzles create a barrier of fluid within the outlet channel to block the flow of particles.
* This innovation helps maintain the cleanliness of the semiconductor process chamber and prevents contamination during the pumping process.


==Original Abstract Submitted==

A semiconductor process system includes a semiconductor process chamber having an interior volume. A pump extracts gases from the semiconductor process chamber via an outlet channel communicably coupled to the semiconductor process chamber. The system includes a plurality of fluid nozzles configured to prevent the backflow of particles from the outlet channel to interior volume by generating a fluid barrier within the outlet channel responsive to the pump ceasing to function.



[[Category:B05B15/58]]
[[Category:B05B12/08]]
[[Category:C23C16/44]]