View source for US Patent Application 18361254. SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES simplified abstract

=SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES=


==Organization Name==

[[:Category:Taiwan Semiconductor Manufacturing Co., Ltd.|Taiwan Semiconductor Manufacturing Co., Ltd.]]


[[Category:Taiwan Semiconductor Manufacturing Co., Ltd.]]

==Inventor(s)==

[[:Category:Tai-Yu Chen of Hsinchu (TW)|Tai-Yu Chen of Hsinchu (TW)]][[Category:Tai-Yu Chen of Hsinchu (TW)]]

[[:Category:Sagar Deepak Khivsara of Hsinchu (TW)|Sagar Deepak Khivsara of Hsinchu (TW)]][[Category:Sagar Deepak Khivsara of Hsinchu (TW)]]

[[:Category:Kuo-An Liu of Hsinchu (TW)|Kuo-An Liu of Hsinchu (TW)]][[Category:Kuo-An Liu of Hsinchu (TW)]]

[[:Category:Chieh Hsieh of Hsinchu (TW)|Chieh Hsieh of Hsinchu (TW)]][[Category:Chieh Hsieh of Hsinchu (TW)]]

[[:Category:Shang-Chieh Chien of Hsinchu (TW)|Shang-Chieh Chien of Hsinchu (TW)]][[Category:Shang-Chieh Chien of Hsinchu (TW)]]

[[:Category:Gwan-Sin Chang of Hsinchu (TW)|Gwan-Sin Chang of Hsinchu (TW)]][[Category:Gwan-Sin Chang of Hsinchu (TW)]]

[[:Category:Kai Tak Lam of Hsinchu (TW)|Kai Tak Lam of Hsinchu (TW)]][[Category:Kai Tak Lam of Hsinchu (TW)]]

[[:Category:Li-Jui Chen of Hsinchu (TW)|Li-Jui Chen of Hsinchu (TW)]][[Category:Li-Jui Chen of Hsinchu (TW)]]

[[:Category:Heng-Hsin Liu of Hsinchu (TW)|Heng-Hsin Liu of Hsinchu (TW)]][[Category:Heng-Hsin Liu of Hsinchu (TW)]]

[[:Category:Chung-Wei Wu of Hsinchu (TW)|Chung-Wei Wu of Hsinchu (TW)]][[Category:Chung-Wei Wu of Hsinchu (TW)]]

[[:Category:Zhiqiang Wu of Hsinchu (TW)|Zhiqiang Wu of Hsinchu (TW)]][[Category:Zhiqiang Wu of Hsinchu (TW)]]

==SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES - A simplified explanation of the abstract==


This abstract first appeared for US patent application 18361254 titled 'SYSTEM AND METHOD FOR PERFORMING EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY PROCESSES

==Simplified Explanation==

- The patent application describes a photolithography system that uses tin droplets to generate extreme ultraviolet radiation for photolithography.
- The system irradiates the tin droplets with a laser, causing them to become a plasma and emit extreme ultraviolet radiation.
- One aspect of the invention is the ability of the system to sense contamination of a collector mirror by the tin droplets.
- The system then adjusts the flow of a buffer fluid to reduce the contamination of the collector mirror.
- The innovation aims to improve the efficiency and effectiveness of photolithography processes by reducing contamination and maintaining the quality of the collector mirror.


==Original Abstract Submitted==

A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.



[[Category:G03F7/00]]